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Development of Separated Pulsed Laser Deposition to Create Nanostructured Composite Materials of Oxides, Nitrides and Organics

Development of Separated Pulsed Laser Deposition to Create Nanostructured Composite Materials of Oxides, Nitrides and Organics
开发分离式脉冲激光沉积技术来制造氧化物、氮化物和有机物的纳米结构复合材料
批准号:
15360171
负责人:
EBIHARA Kenji
金额:
$9.41万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2006

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中文摘要
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英文摘要
We have developed an alternative laser deposition technique for preparation of droplet-free thin films and fine particles. This separated pulsed laser deposition (SPLD) consists of an ablation chamber and a deposition chamber which are independently evacuated under different ambient gases.High quality ZnO films exhibiting both particle-free and uniform deposition were obtained such as at an ablation pressure of 5mTorr(Ar) and a deposition pressure of 10mTorr(O2). It is shown that, when the bias voltage and magnetic field are simultaneously applied in the deposition chamber, the ExB drift motion of about 70km/sec over the substrates contributes to deposit the smooth and high quality films. The deposited ZnO film showed high preferential orientation of (002) plane, optical band gap of 3.1eV, grain size of 42nm and surface roughness of 0.8nm. The XRD patterns for these samples show that the FWHM of the film at 500V has small value of 0.318° indicating good crystallinity. This SPLD is a promising technique for preparation of films and nanostructured particles.
期刊论文(85)
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DOI: 10.1016/j.tsf.2005.08.042
发表时间: 2006-05
期刊: Thin Solid Films
影响因子: 2.1
作者: [T. Ohshima;S. Nakashima;T. Ueda;Hiroharu Kawasaki;Y. Suda;K. Ebihara]
通讯作者: T. Ohshima;S. Nakashima;T. Ueda;Hiroharu Kawasaki;Y. Suda;K. Ebihara
DOI: 10.1016/j.tsf.2005.08.312
发表时间: 2006-05
期刊: Thin Solid Films
影响因子: 2.1
作者: [H. Shinguu;M. Bhuiyan;T. Ikegami;K. Ebihara]
通讯作者: H. Shinguu;M. Bhuiyan;T. Ikegami;K. Ebihara
Effect of electric and magnetic fields on separated PLD method
电场和磁场对分离PLD方法的影响
DOI: --
发表时间: 2007
期刊: 10th International Symposium on High Pressure Low Temperature Plasma Chemistry,Saga,Japan,September 4-8,Proceeding book P.20
影响因子: --
作者: [Shingo Yamaguchi, Sang-Moo Park, Kenji Ebihara, Tomoaki Ikegami]
通讯作者: Tomoaki Ikegami
K.Ebihara, T.Tanaka, T.Ikegami, K.Yamashita, Y.Oyama: "Application of the dielectric barrier discharge to detect defects in a Teflon coated metal surface"Journal of Physics D : applied physics. 36. 2883-2886 (2003)
K.Ebihara、T.Tanaka、T.Ikegami、K.Yamashita、Y.Oyama:“应用介质阻挡放电来检测特氟龙涂层金属表面的缺陷”物理学杂志 D:应用物理学。
DOI: --
发表时间:
期刊:
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作者: []
通讯作者:
60
    Smart Advanced Materials/Devices by Laser/Plasma Process
    • 批准号:
      10045046
    • 项目类别:
      Grant-in-Aid for Scientific Research (B).
    • 资助金额:
      $4.48万
    • 财政年份:
      1998
    • 负责人:
      EBIHARA Kenji
    • 依托单位:
    海外基金