Study of new deposition method for the DLC thin film by using a pseudo-spark discharge CVD

本研究发展了一种新型的薄膜沉积系统，利用准火花放电等离子体射流沉积类金刚石薄膜。这种放电是低压区的大电流放电。发现高密度（10 μ m2量级）的等离子体<20><-3>在电极中心轴的半径50 mm内喷出。喷射等离子体射流的离子密度取决于阳极孔的直径、电极之间的距离、放电电流和气体流速。但是，在本实验条件下，电磁力的影响几乎不受放电电流的影响，因此不能通过大电流放电来证实电磁力的影响。沉积实验的结果表明，薄膜存款在硅衬底上是成功的。

In this research, a new thin film deposition system is developed that a diamond-like carbon film is generated by using a pseudo-spark discharge plasma jet. This discharge is a large current discharge at low pressure region. It was found that plasma of high density (the order of 10^<20>m^<-3>) was spouted out within a radius of 50 mm of the center axis for the electrodes. The ion density of spouted plasma jet depends on the diameter of anode hole, distance between the electrodes, the discharge current and the rate of gas flow. But effect of the electromagnetic force can't confirm by discharge current as large as it isn't almost influenced by the discharge current in this experimental conditions. As a result of deposition experiment, it is succeeded that the thin film deposit on the silicon substrate.