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High quality Quantum Dots for 1.55 micron wavelength on GaAs substrate

High quality Quantum Dots for 1.55 micron wavelength on GaAs substrate
GaAs 基板上 1.55 微米波长的高质量量子点
批准号:
22560016
负责人:
SUGIMOTO Yoshimasa
金额:
$2.75万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2012

项目摘要

项目成果

相关文献

中文摘要
翻译
InAs/GaAs QDs的发射波长度的扩展利用双层QDs的增长已被调查。该扩展已通过对上层(活性) QDs的扩展找到,以优化几个增长参数:较低(种子) QDs的增长温度,InAs的数量可供种子和活性QDs提供。这些最优化的参数降低了种子-QD应变传播向上的密度,并在对活动-QD的介绍中得到了哪些结果。我们对发射波的扩展进行了控制,达到了接近1.4 ·m。我们还研究了GaNAs/AlGaAs在GaAs上的异构结构(100)基础上的增长,由等离子体辅助分子光束外延。通过介绍周期性增长中断和营养素(N)为GaNAs增长期间的中断表面提供,我们实现了GaNAs层中平均N浓度的高控制性。我们观察到GaNAs在N-富表面上的三个维度岛屿增长,InAs/GaAs QD的发射波长的扩展,使用双层QD增长已被调查。该扩展已发现与对上层(活性) QDs的扩展进行了比较优化的几个增长参数:较低(种子) QDs的增长温度,InAs的数量可供种子和活性QDs提供。这些最优化的参数降低了种子-QD应变传播向上的密度,并在对活动-QD的介绍中得到了哪些结果。我们对发射波的扩展进行了控制,达到了接近1.4 ·m。我们还研究了GaNAs/AlGaAs在GaAs上的异构结构(100)基础上的增长,由等离子体辅助分子光束外延。通过介绍周期性增长中断和营养素(N)为GaNAs增长期间的中断表面提供,我们实现了GaNAs层中平均N浓度的高控制性。我们观察到GaNAs在N-丰富表面上的三维岛屿增长。
英文摘要
Extensions of emission wavelength of InAs/GaAs QDs by using bi-layer QD growth have been investigated. The extension has been found with an enlargement of the upper layer (active) QDs occurred by optimizing several growth parameters: growth temperature of lower (seed) QDs, amount of InAs supplied for seed- and active-QDs. These optimized parameters lowered the density of the seed-QDs strain spreading upward, which resulted in an enlargement of the active-QDs. We achieved a control of the extension of emission wavelength up to approximately 1.4 ・m. We also studied the growth of GaNAs/AlGaAs heterostructures on GaAs (100) substrates by plasma-assisted molecular beam epitaxy. By introducing periodic growth interruption and nitrogen (N) supply to the interrupted surfaces during the growth of GaNAs, we achieved high controllability of the average N concentration in GaNAs layers. We observed three-dimensional island growth of GaNAs on the N-rich surfaces.Extensions of emission wavelength of InAs/GaAs QDs by using bi-layer QD growth have been investigated. The extension has been found with an enlargement of the upper layer (active) QDs occurred by optimizing several growth parameters: growth temperature of lower (seed) QDs, amount of InAs supplied for seed- and active-QDs. These optimized parameters lowered the density of the seed-QDs strain spreading upward, which resulted in an enlargement of the active-QDs. We achieved a control of the extension of emission wavelength up to approximately 1.4 ・m. We also studied the growth of GaNAs/AlGaAs heterostructures on GaAs (100) substrates by plasma-assisted molecular beam epitaxy. By introducing periodic growth interruption and nitrogen (N) supply to the interrupted surfaces during the growth of GaNAs, we achieved high controllability of the average N concentration in GaNAs layers. We observed three-dimensional island growth of GaNAs on the N-rich surfaces.
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DOI: 10.1016/j.jcrysgro.2012.12.110
发表时间: 2013-09
期刊: Journal of Crystal Growth
影响因子: 1.8
作者: [N. Ozaki;Y. Nakatani;S. Ohkouchi;N. Ikeda;Y. Sugimoto;K. Asakawa;E. Clarke;R. Hogg]
通讯作者: N. Ozaki;Y. Nakatani;S. Ohkouchi;N. Ikeda;Y. Sugimoto;K. Asakawa;E. Clarke;R. Hogg
周期的成長中断を用いたGaNAs三次元島状構造の作製
利用周期性生长中断制造 GaN 三维岛结构
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [関野高明, ら]
通讯作者: ら
近接二層積層によるGaAs基板上InAs-QDの発光長波長化の検討(II)
通过堆叠相邻两层来增加GaAs衬底上InAs-QDs发射波长的研究(二)
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [H.Ueda, T.Kanki, H.Tanaka, 中谷擁平,尾崎信彦,大河内俊介,池田直樹,杉本喜正,Edmund Clarke,Richard Hogg]
通讯作者: 中谷擁平,尾崎信彦,大河内俊介,池田直樹,杉本喜正,Edmund Clarke,Richard Hogg
窒素デルタドーピングを用いたGaNAs量子井戸の窒素濃度制御
使用氮δ掺杂控制 GaN 量子阱中的氮浓度
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [間野高明, 定昌史, 黒田隆, M.Elborg, 野田武司, 杉本喜正, 迫田和彰]
通讯作者: 迫田和彰
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