Establishment of hybrid ring-shaped hollow discharge and application to large-diameter high-density plasma source

射频电容耦合放电等离子体技术被广泛应用于制备太阳能电池板和液晶显示器件等功能薄膜。然而，射频电容耦合等离子体具有一个弱点，即薄膜的生产率非常低。因此，微电子工业需要高密度等离子体源。在这项工作中，提出了一种新的等离子体生产方法，并得到证实。通过环形空心电极与高二次电子发射材料涂层的结合，达到了这一要求。今后，这一提议可以通过扩大规模来实现。

Radio frequency(RF) capacitively coupled discharge plasma is widely used for the preparation of functional thin films which play an important role for solar panel and liquid crystal display devices. However, the RF capacitively coupled plasma has a weak point that the productivity of the thin films is very low. Thus, high-density plasma source is required from the microelectronic industry. In this work, a novel plasma production method is proposed and is confirmed. The requirement is attained by the combination between ring-shaped hollow electrode and the coating of high secondary electron emission material to the electrode. In future, this proposal can be attained by developing the scale-up.