Development of new measurement techniques for application of glow discharge optical emission spectroscopy to plasma-surface interaction studies

辉光放电光学发射光谱(GDOES)可以对固体样品中的组成元素进行高分辨率和快速的深度剖析。这些特性原则上适用于聚变装置中使用的面向等离子体的材料(PFM)的分析。然而，对PFM分析有特殊的要求：(1)同位素分析，(2)氢同位素的定量测量，(3)氦的检测，(4)氢同位素含量对材料溅射速率的影响。研究表明：(1)商用GDOES装置中的衍射栅具有足够高的分辨率来分别检测H和D；(2)吸氢材料薄膜适合作为氢同位素定量分析的标准样品；(3)利用高功率、高压的Ne等离子体可以检测氦；(4)氢同位素含量对碳氢共沉积薄膜的溅射速率没有显著影响。

Glow-discharge optical emission spectroscopy (GDOES) allows high resolution and rapid depth profiling of constituent elements in a solid specimen. These features are in principle suitable for the analysis of plasma-facing materials (PFMs) used in fusion devices. There are, however, special requirements for PFM analysis: (1) isotope analysis, (2) quantitative measurement of hydrogen isotopes, (3) helium detection, and (4) influence of hydrogen isotope content on sputtering rate of materials. This study has revealed that (1) resolution of diffraction grating in a commercial GDOES device is sufficiently high to separately detect H and D, (2) thin films of hydrogen absorbing materials are suitable as a standard sample for quantitative analysis of hydrogen isotopes, (3) helium detection is possible using high power, high pressure Ne plasma and (4) there is no significant influence of hydrogen isotope content on sputtering rate of carbon-hydrogen co-deposited films.