X-Ray Nanolithography Facility: Towards the ultimate resolution

该项目旨在通过建立基于同步加速器的x射线纳米光刻设备来满足精确和可扩展的纳米级制造需求。该项目期望通过结合相干光刻和相干成像计量的创新方法，在先进制造和纳米技术领域产生新的知识。该项目的预期成果包括国际独特的、国家可访问的纳米级制造能力和行业驱动的合作研究。这将为旨在利用工程纳米材料的独特特性来极大地提高解决全球挑战所需的技术的各个领域提供显著的好处。

This Project aims to address the need for precise and scalable nanoscale fabrication by establishing a synchrotron-based X-Ray Nanolithography Facility. This Project expects to generate new knowledge in the areas of advanced manufacturing and nanotechnology using an innovative approach that combines coherent lithography and coherent imaging metrology. Expected outcomes of this project include an internationally unique, nationally accessible capability for manufacturing at the nanoscale and for industry-driven collaborative research. This should provide significant benefits across fields that aim to harness the unique properties of engineered nanomaterials to greatly enhance the technologies required to solve global challenges.