Mechanical nanolithography without solvents - a step towards sustainable nanomanufacturing

无溶剂机械纳米光刻——迈向可持续纳米制造的一步

• 批准号: EP/W034387/1
• 负责人: Harish Bhaskaran
• 金额: $ 68.1万
• 依托单位: University of Oxford
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2023
• 资助国家: 英国
• 起止时间: 2023 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FW034387%2F1
• 关键词: Mechanical; nanolithography; without; solvents; step

In the post-Moore's law era, innovative new technologies to accelerate scientific computing and memory devices are growing explosively, amongst which photonic memory devices have been attracting a great amount of interest and hold future promise for built-in, non-volatile memory with high density, fast switching, multifunctionality, low-energy consumption, and multilevel data storage compared to electronic memory devices. It is now timely to ensure that these new device concepts are developed alongside new sustainable processes - as it is in the introduction stage of new products that manufacturing processes can also be changed. Current manufacturing of high-resolution semiconductor devices primarily relies on photolithography as the patterning technique of choice. During the fabrication of these resist-based lithography techniques, development and lift-off steps utilize alkaline solutions and organic solvents as developers and removers. These are two of the main sources of hazardous chemical wastes . The US Environmental Protection Agency developed a waste management hierarchy, which states that the most preferred approach is source reduction and reuse, followed by recycling, energy recovery, treatment and disposal. Therefore, the development of a water-based manufacturing technique which limits the amount of hazardous chemicals at the source is essential to the minimization of chemical wastes. This will lead to higher resource efficiency and more efficient recycling and recovery of processing waste.That is precisely what this proposal will target. The vision is to develop facile, inexpensive, scalable solvent-free lithography for nanomanufacturing, which eliminates solvents in as many lithography processes as possible but doing this in a reliable and functionally enabling manner.

在后摩尔定律时代，加速科学计算和存储设备的创新新技术正在爆炸式增长，其中光子存储设备已经引起了人们的极大兴趣，并且与电子存储设备相比，具有高密度，快速开关，多功能，低能耗和多级数据存储的内置非易失性存储器具有未来的前景。现在是时候确保这些新设备概念与新的可持续工艺一起开发了-因为在新产品的引入阶段，制造工艺也可以改变。目前高分辨率半导体器件的制造主要依靠光刻作为选择的图形技术。在这些基于电阻的光刻技术的制造过程中，开发和剥离步骤使用碱性溶液和有机溶剂作为显影剂和去除剂。这是危险化学废物的两个主要来源。美国环境保护署制定了一个废物管理等级制度，其中指出，最受欢迎的方法是减少来源和再利用，其次是回收、能源回收、处理和处置。因此，开发一种从源头限制危险化学品数量的水基制造技术，对尽量减少化学废物至关重要。这将导致更高的资源效率，更有效地回收和回收加工废物。这正是这项提案的目标。我们的愿景是为纳米制造开发简单、廉价、可扩展的无溶剂光刻技术，在尽可能多的光刻工艺中消除溶剂，但以可靠和功能可行的方式完成。

项目成果

Ultra-Efficient Plasmonic Phase-Change Devices on SOI Platform

SOI 平台上的超高效等离子体相变器件

• DOI: 10.1364/cleo_si.2023.sth1o.7
• 发表时间: 2023
• 作者: He Y

Reconfigurable nonlocal metasurface based on phase change materials

基于相变材料的可重构非局部超表面

• DOI: 10.1117/12.2675688
• 发表时间: 2023
• 作者: Yang G