Engineering magnetism at the atomic scale in topological insulators

本项目旨在探索通过离子注入加入掺杂剂和利用磁性薄膜异质结构中的邻近效应来优化磁化和居里温度的策略。最近在拓扑绝缘体中发现的磁性开辟了一类新的材料，在节能电子，数据存储和信息处理方面具有潜在的应用。核心挑战是控制潜在的磁性结构，并在理想的温度下稳定磁性秩序。该项目希望发现新的复合材料，并提高我们在设计下一代超低功耗电子产品中的磁性元件方面的知识。

This project aims to explore strategies to optimise the magnetisation and Curie temperature by incorporating dopants via ion implantation, and exploiting proximity effects in heterostructures with magnetic thin films. The recently discovered magnetism in topological insulators opens up a new class of materials with potential applications in energy-efficient electronics, data storage and information processing. The central challenges are to control the underlying magnetic structure and stabilise magnetic order at desirable temperatures. The project expects to discover new composite materials and advance our knowledge for designing magnetic components in the next generation of electronics with ultra-low power dissipation.