Metrology concepts for a new generation of plasma manufacturing with atom-scale precision

这项研究建议的目的是解决实时计量控制灵活和可重构的技术等离子体系统的挑战。等离子体技术不仅支撑着当今数十亿英镑的高端制造业，而且也是未来新设备发明的关键要素。一场新的革命正在等离子体处理中进行;英特尔公司的“常春藤桥”三维原子层纳米结构和元素六的新碳基超级材料才刚刚实现。下一代等离子体处理的应用前景包括单层石墨烯的边缘键合操作、作为传感器或神经动力装置的低功率生物植入芯片、用于生物燃料合成的创新化学应用和微型电池的实现、柔性微电子、微机电装置的制造以及直接将等离子体用于医学、所有这些的实现关键取决于新的适应性等离子体处理技术的发展。随着行业的转型，这是一个令人兴奋的时刻。一个关键的瓶颈是缺乏适应性强的过程控制。我们提出了一种新的非侵入式传感器和虚拟计量的概念，以监测基板相关参数，使实时等离子体调谐。我们的创新传感器-脉冲诱导光发射光谱（PiOES）类似于激光诱导荧光光谱，它将利用非侵入式低电压快速纳秒电子脉冲代替激光，在等离子体中产生类似的激发条件。电子碰撞激发将产生瞬态激发态，并且通过随后的光学荧光和相关的时间指纹，可以识别不同的原子和分子。该技术的功率和灵敏度源于利用非线性等离子体表面界面（鞘层）区域中的能量动力学以及粒子数动力学。我们的研究计划旨在开发和展示我们在三种极端工作环境下的计量技术：低压各向异性等离子体蚀刻、人造金刚石制造以及用于医学和制药的大气等离子体。我们将在全制造反应堆和环境中演示这种计量技术。该项目是该领域世界领先者之间的合作：约克大学，布里斯托大学，英特尔公司，Element Six、Andor Technology、Quantemol、Smith and Nephew、Hiden Analytical和Oxford Instruments。已经设立了一个咨询委员会，其中包括来自不同公司和学术界的主要成员，以确保随着项目的进展，工业相关性和吸收。

This research proposal is targeted at addressing the challenge of real-time metrology for control of flexible and reconfigurable technological plasma systems. Plasma technologies not only underpin many high-end multi-billion pound manufacturing industries of today, but also are critical elements for the invention of new devices of the future. A new revolution is underway in plasma processing; the 'ivy-bridge' 3-dimensional atomic layer nano-structures of Intel Corp. and new carbon-based supermaterials of Element Six have only just been realised. This opens up new horizons for inventions.Envisaged applications of next-generation plasma processing include manipulation of edge-bonds of single-layer graphene, low power biologically implanted chips as sensors or neuro-motive devices, innovative chemistry applications for biofuel synthesis and realisation of micro-batteries, flexible micro-electronics, fabrication of micro-electromechanical devices, as well as directly using plasmas for medicine, surgery and pharmacy.Realisation of all these critically depends on the development of new adaptable plasma processing techniques. As the industry transforms itself this is an exciting time. One critical bottleneck is the lack of adaptable process control. We propose a novel non-invasive sensor and virtual metrology concept to monitor substrate relevant parameters to enable real-time plasma tuning. This has developed from our pioneering research on the topic and recent discoveries.Our innovative sensor - pulse induced optical emission spectroscopy (PiOES) is analogous to laser induced fluorescence spectroscopy and will instead of a laser utilise a non-intrusive low voltage rapid nanosecond electronic pulse to generate similar excitation conditions in the plasma. Electron impact excitation will create transient excited states and through the subsequent optical fluorescence, and associated temporal fingerprint, distinct atoms and molecules can be identified. The power and sensitivity of the technique originates from exploiting both the energy dynamics as well as the population dynamics in the nonlinear plasma-surface interface (sheath) region. This will allow detection down to atomic layer defects within micron locality.The aim of our research programme is to develop and demonstrate our metrology technique in three extreme working environments: low pressure anisotropic plasma etching, synthetic diamond manufacturing, and atmospheric plasmas for medicine and pharmacy. We will demonstrate this metrology technique in full fabrication reactors and environments. This project is a collaboration between world-leaders in the field: The University of York, The University of Bristol, Intel Corp., Element Six, Andor Technology, Quantemol, Smith and Nephew, Hiden Analytical and Oxford Instruments. An advisory board, including leading members from a diverse range of companies and academia, has been installed to ensure industrial relevance and uptake as the project progresses.