X-RAY DIFFRACTION CAPABILITY FOR NANOSCALE AND THIN FILM STRUCTURE

物质在原子尺度上的特殊排列使先进的功能材料具有独特的性质。因此，材料设计的未来取决于我们控制纳米结构的能力。为了实现这一目标，材料科学家的一个重要工具是X射线衍射，因为它允许深入表征晶体结构。在这里，我们建议建立一种专门用于纳米级和薄膜结构的X射线衍射仪，该仪器具有一系列功能，使材料科学家能够研究多晶膜和外延膜的结构特性，并探索通常决定纳米材料性能和功能的界面质量和结构。该设备提供的高通量能力将在功能材料的原子尺度设计和设备集成的工艺优化中发挥至关重要的作用。它将使使用非破坏性方法对相纯度、结晶质量、厚度和粗糙度进行常规测量成为可能。更先进的测量将被用来确定纳米结构的外延关系和织构。所研究的材料在可再生能源(光伏、电池、热电)、电子(透明导电氧化物、电介质、半导体合金)中有应用。

The specific arrangements of matter at the atomic scale gives advance functional materials their unique properties. Therefore, the future in materials design relies on our ability to control nanoscale structures. To achieve this, a vital tool for material scientist is x-ray diffraction as it allows in-depth characterisation of the crystal structure.Here we propose to establish an x-ray diffractometer dedicated to nanoscale and thin film structure with a set of capabilities which will enable material scientist to study the structural properties of polycrystalline and epitaxial films and probe the interface quality and structure which often dictates the performance and functionality of the nanoscale material. The high throughput capability offered by this equipment will play a vital role in atomic scale design of functional materials and process optimisation for integration in device. It will enable the routine measurement of phase purity, crystalline quality, thickness and roughness using non-destructive method. More advanced measurements will be used to determine epitaxial relationship and texture of the nanostructures. The materials studied have applications in renewable energy (photovoltaic, battery, thermoelectric), electronic (transparent conducting oxides, dielectrics, semiconductor alloys)