Wafer-Scale Manufacturing of Single-Crystal Perovskite Optoelectronics

单晶钙钛矿具有优异的光电性能和稳定性，在未来的高效光电器件中具有很大的应用前景。与多晶钙钛矿相比，单晶钙钛矿在环境条件下不受形态无序和表面降解引起的不稳定性的影响，具有低陷阱密度、高迁移率、低固有载流子浓度和长载流子扩散长度等显著的光电性能。单晶钙钛矿的规模化生产目前面临着两个重大的制造挑战。首先，晶圆尺寸和微米厚度的单晶钙钛矿薄膜是非常难以实现的，因为一个种子晶体只能生长成具有有限宽厚比的单晶薄膜，而多个随机取向的种子晶体形成多晶钙钛矿薄膜。其次，单晶薄膜的图像化是大规模制造钙钛矿集成光电器件的关键一步，但目前还无法实现。与硅不同，钙钛矿对高温和极性溶剂敏感。因此，传统的可扩展光刻方法无法用于开发集成光电器件的纳米/微米分辨率表面图案。在这个项目中，我们的目标是通过开发大规模生产单晶钙钛矿光电子产品的可扩展和高产量制造工艺来解决这些挑战。一个概念验证的可控和可扩展的制造工艺将被交付，以制造晶圆尺寸（1英寸及以上）和微米/亚微米薄（<2微米）具有纳米分辨率表面图案（~50nm）的单晶钙钛矿薄膜。我们将利用纳米单晶钙钛矿薄膜制造太阳能电池和光电探测器，并测试其性能。该项目的成果将是向单晶钙钛矿光电器件规模化制造迈出的关键一步，并有望改变单晶光电制造，加强英国在该领域的领先地位。

Single-crystal perovskites possess exceptional optoelectronic properties and stability and are very promising for making future high-efficiency optoelectronic devices. Compared to their polycrystalline counterparts, single-crystal perovskites are free from the instabilities caused by morphological disorder and surface degradation under ambient conditions, and have remarkable optoelectronic properties, such as low trap density, high mobility, low intrinsic carrier concentration and long carrier diffusion length. The scalable manufacturing of single-crystal perovskite is currently facing two significant manufacturing challenges. Firstly, wafer-size and micrometre thickness single-crystal perovskite thin films are extremely difficult to achieve, because one seed-crystal can only grow into a single-crystal thin film with a limited width-to-thickness aspect ratio, while multiple randomly oriented seed crystals form polycrystalline perovskite thin films. Secondly, patterning single crystal thin films is a key enabling step towards the manufacture of perovskite integrated optoelectronic devices on a large scale, but this is currently unavailable. Unlike silicon, perovskites are sensitive to high temperature and polar solvents. Therefore, traditional scalable lithography methods cannot be applied to develop nanometre/micrometre-resolution surface patterns for integrated optoelectronic devices. In this project we aim to address these challenges by developing a scalable and high-yield manufacturing process for mass-producing single-crystal perovskite optoelectronics. A proof-of-concept controllable and scalable manufacturing process will be delivered, to fabricate wafer-size (1-inch and above) and micrometre/sub-micrometre thin (<2 micrometres) single-crystal perovskite films with nanometre-resolution surface patterns (~50nm). We will fabricate solar cells and photodetectors using our nanopatterned single-crystal perovskite thin films and test their performances. The outcome of this project will be a crucial step towards the scalable manufacturing of single-crystal perovskite optoelectronic device, and is expected to transform the single-crystal optoelectronic manufacturing and to strengthen the UK's leading position in this field.