Novel x-ray interferometers for length metrology

亚纳米精度的定位和测量是现代半导体和量子器件开发的基础，其中器件性能在很大程度上取决于纳米尺度。为了应对这一挑战，硅的晶格参数已被正式采用作为纳米计量学的长度尺度的基础。实现这一点的一种方法是X射线干涉测量法;用于具有亚原子精度的纳米测量的标尺或定位系统阶段。该项目的目的是设计和制造高效率的x射线干涉仪，适用于一系列尺寸纳米测量应用，包括超精密定位和纳米级位移传感器的表征，这将支持微电子和量子器件的制造。射线干涉仪将基于超高精度柔性平台的有限元建模，这些平台可以用硅加工，模型用作数字孪生X射线干涉仪的制造非常具有挑战性，需要在加工脆性材料、高纵横比结构和最小化加工过程中的表面损伤方面的专业知识。优化加工参数，测试加工部件的材料和机械性能，沿着对这些具有不同几何形状和性能的部件的行为进行建模，是敏捷、高效和适合目的制造的关键。目的：1.回顾了硅基柔性基板设计与制造的最新进展.开发原型分析和有限元弯曲模型（弯曲虚拟孪生），推导加工公差，并验证弯曲运动的假设实验为一个简单的情况。定义关键的制造绩效并制定柔性件的制造策略.在典型的X射线干涉仪设置中制造原型弯曲件并评估所需的性能。

Positioning and measuring with sub-nanometre accuracy are fundamental in the development of modern semiconductor and quantum-based devices where device performance depends heavily on the nanoscale dimensions. To meet this challenge, the lattice parameter of silicon has been formally adopted as the basis of a length scale for nano-metrology. One method for implementing this is x-ray interferometry; a ruler or positioning system stage for nanometrology with subatomic accuracy. The aim of the project is to design and manufacture efficiently x-ray interferometers suitable for a range of dimensional nanometrology applications including ultra-precision positioning and characterisation of nanoscale displacement sensors that will support manufacturing of micro-electronics and quantum devices.The projectThe design of the x-ray interferometer will be based around finite element modelling of ultra high accuracy flexures stages that can be machined from silicon with the model being used as basis for a digital twin. The manufacture of X-ray interferometers is very challenging requiring expertise in machining of brittle materials, high aspect ratio structures and minimisation of surface damage from the machining process. Optimisation of machining parameters, testing the materials and mechanical properties of the machined components along with modelling the behaviour of these components with varying geometries and properties, is key for an agile, efficient and fit-for purpose manufacturing. Objectives:1. Review state-of-art of flexures' design and manufacturing considering Si based substrates.2. Develop prototype analytical and FEM flexure model (flexure virtual twin), derive machining tolerances and validate the flexure movement assumptions experimentally for a simple case.3. Define key manufacturing performance and develop manufacturing strategies of the flexure.4. Manufacture prototype flexure and evaluate the required performance in typical X-ray interferometer set-up.