Hydraulic Fracturing of Controlled Release Oxidants for Remediation of Low Permeability Zones

项目摘要/摘要AxNano，LLC SBIR FastTrack 2019 美国环保署估计，每四个美国人中就有一个居住在危险废物周围三英里以内 地点。为了满足日益增长的修复这些受污染场地的需求，美国的修复市场一直在 自2009年以来稳步增长，平均每年增长2-3%。全球环境修复 预计2019年技术市场规模将扩大至805亿美元。修复受污染场地的费用可能会很高 数百万美元以上，可以持续几十年，特别是在具有挑战性的地质环境中，如Low 渗透率(低k)带(如粘土和基岩)。污染物集中在低污染地区的地点 渗透带是一个特别令人头疼的行业问题，因为这些区域可以充当地下“源区”。 提供长达数十年的污染物向传播区的缓慢释放。传统的，液相 在渗透率较高的地区成功使用的补救注射，当应用于低K区时，通常 导致只进行部分清理，然后进行长期的现场管理。要解决成本高昂的重新申请问题 反弹(修复后污染物浓度增加)和尾矿(永久性非零 污染物水平)是环境工程师最大的痛点之一。这些篮板和 尾矿导致责任增加，补救成本增加，补救计划旷日持久。AxNano， 与北卡罗来纳州A&T合作，专门制定了他们的专利控制释放技术 以解决这些持久的低k区问题。RemRx®CRI，控释注射剂，可放置在低k 通过水力压裂和提供持续水平的Isco试剂直接进入被困区域 用一次/几次应用解决这些反弹和尾矿问题的污染区域。 AxNano已经建立了原型和初步研究，以支持FastTrack SBIR计划。阶段 该计划的第一阶段将支持RemRx®CRI的开发，通过在低成本环境下对原型进行小规模测试。 K区二维流动腔和影响半径的计算模型估算。第二阶段旨在试行- 规模展示了在皮埃蒙特地区的两个地点制造第一阶段验证的MVP和现场测试。 现场演示将包括与直接氧化剂性能的比较。来自试点规模的数据 将使用演示和计算建模来设计全面部署。AxNano将设计 支持RemRxTM CRI技术向未来大规模过渡的全规模制造工艺 部署。 该技术开发计划利用独特的知识产权地位来开发这一点 新的RemRxTM产品系列。修复和更广泛的水/废水市场是复杂的，使 市场难以接受新的补救技术。然而，Isco控释剂具有很强的 利息。AxNano团队致力于实现这种高影响力的成功商业化 技术

Project Summary/Abstract AxNano, LLC SBIR Fasttrack 2019 The EPA estimates that one out of every four Americans lives within three miles of a hazardous waste site. To meet the growing need for remediating these contaminated sites, the US remediation market has been increasing steadily since 2009, averaging 2-3% increases per year. The global environmental remediation technology market is forecasted to expand to $80.5 billion in 2019. Remediation of contaminated sites can cost upwards of millions of dollars and can last for decades, especially in challenging geological settings such as low permeability (low-k) zones (e.g., clay and bedrock). Sites where contaminants are concentrated in low permeability zones are a particular industry headache as these areas can serve as sub-surface “source zones” providing slow release of contaminants into transmissive zones for decades of longer. Traditional, liquid-phase remediation injections that are successfully used in more permeable areas, when applied to low-k zones often result in only partial clean-up followed by chronic site management. Costly re-applications to address rebounding (increases in contaminant concentration following remediation) and tailings (persistent non-zero contaminant levels) are one of the biggest pain-points for environmental engineers. These rebounding and tailings lead to increase liability, increased remediation cost, and long drawn-out remediation schemes. AxNano, in collaboration with North Carolina A&T, has specially formulated their patented controlled release technology to address these persistent low-k zones. RemRx® CRI, controlled release injectant, can be emplaced into low k zones by hydraulic fracturing and provide sustained levels of ISCO reagents directly into the trapped contaminated area with one/few applications to address these issues of rebounding and tailings. AxNano has established prototypes and preliminary studies to support a Fasttrack SBIR program. Phase I of the program will support the development RemRx® CRI, through bench-scale testing of prototypes in low- k zone 2-D flow chambers and radius of influence estimation by computational modeling. Phase II aims to pilot- scale demonstrate manufacturing the Phase I-validated MVP and field test at two sites in the Piedmont Region. Field demonstrations will include comparison to straight oxidant performance. Data from pilot-scale demonstration and computational modeling will be used to design full-scale deployments. AxNano will design a full scale manufacturing process to support transition of the RemRxTM CRI technology to future large scale deployment. This technology development program leverages a unique intellectual property position to develop this new RemRxTM family of products. The remediation and broader water/wastewater markets are complex, making market uptake of new remediation technologies difficult. However, controlled release ISCO agents are of strong interest. The AxNano Team is committed to achieving the successful commercialization of this high-impact technology.