Towards recovery of used water generated by a semiconductor surface cleaning process

由于对微电子的空前需求，半导体工业经历了快速增长 在人类生活的几乎所有方面，包括通信，运输和消费品。这 由于产生大量的废水，扩建带来了很大的环境问题 含有有机和无机化合物作为在制造的各个步骤中产生的副产物 微电子和微机电系统。因此，Teledyne面临的最大挑战之一 DALSA Semiconductor（位于加拿大QC的Bromont）是生产的使用水量。可持续发展的方针 应对这一挑战的方法是处理使用过的水并将其重新用于其他制造过程。这也将 允许回收化学品。因此，本建议书所述项目的目标是 表征Teledyne采用的半导体表面清洁工艺产生的废水 DALSA Semiconductor在魁北克省布罗蒙特的MiQro创新合作中心（C2MI）的安装 然后评估各种水处理技术，以实施水回收的最佳策略。因此，在本发明中， 我们的研究将为未来的合作研究提供设计中试工厂系统所需的信息 项目

The semiconductor industry has experienced rapid growth due to an unprecedented demand of microelectronics in virtually all aspects of human life including communications, transport, and consumer products. This expansion has brought a great environmental concern due to generation of large quantities of used water containing organic and inorganic compounds as by-products generated during the various steps of fabrication of microelectronics and microelectromechanical systems. Therefore, one of the greatest challenges of Teledyne DALSA Semiconductor based in Bromont, QC is the amount of used water produced. A sustainable approach to meet that challenge is to treat the used water and reuse it in other manufacturing processes. This would also allow the recovery of chemicals. Therefore, the objective of the project described in this is proposal is to characterize used water generated by the semiconductor surface cleaning process employed at Teledyne DALSA Semiconductor's installations at the MiQro Innovation Collaborative Center (C2MI) in Bromont, QC and then evaluate diverse water treatment technologies to implement the best strategy for water recovery. Thus, our study will provide the required information to design a pilot plant system in a future collaborative research project.