掺杂自诱导增强Si基AlGaN深紫外LED研究
批准号:
62004196
项目类别:
青年科学基金项目
资助金额:
24.0 万元
负责人:
蒋科
依托单位:
学科分类:
半导体光电子器件与集成
结题年份:
2023
批准年份:
2020
项目状态:
已结题
项目参与者:
蒋科
中文摘要
Si基AlGaN深紫外LED具有无污染、体积小、寿命长等优势,在医疗卫生、环境保护和信息技术等领域具有广泛应用前景。当前,Si基AlGaN深紫外LED量子效率低下,主要原因之一在于高Al组分AlGaN材料p型掺杂困难。针对于此,本项目提出通过引入掺杂自诱导电离增强机制提高空穴浓度,增加空穴注入效率,进而解决Si基AlGaN深紫外LED效率低下问题。本项目将研究掺杂自诱导增强受主离化机制,揭示掺杂自诱导结构参数对空穴浓度及迁移率影响规律,探明极化诱导与掺杂自诱导协同作用,掌握掺杂自诱导参数对LED效率影响规律;将利用MOCVD实现Mg周期富集并梯度渐变的掺杂自诱导结构,调控组分渐变梯度和掺杂自诱导结构参数,获得高效掺杂的p-AlGaN生长技术,并基于此制备Si基AlGaN深紫外LED器件。本项目为提升高Al组分p-AlGaN效率提供了新思路,有望推动Si基AlGaN深紫外LED的实用化进程。
英文摘要
The Si-based AlGaN DUV-LEDs have the advantages of pollution-free, portability, long-life time, and thus possess great potential in the fields of public health, environmental protection, information technology. However, the current quantum efficiency of the available Si-based AlGaN DUV-LEDs is extremely low and one of the main reasons is the difficulty of p-type doping in AlGaN materials. In the project, we plan to increase the LED quantum efficiency through improving the p-AlGaN doping efficiency by adopting the "dopant-self-induced ionization enhanced mechanism" to improve the hole concentration and the hole injection efficiency. We will study the physical mechanism of the "dopant-self-induced ionization enhencement", analyse the impact mechanism of the dopant-self-induced doping structure parameters on the hole concentration and mobility, reveal the cooperative enhancement mechanism between the polarization-induced doping and the dopant-self-induced doping methods, and master the influence law of the dopant-self-induced doping structure parameters on LED efficiency. We will apply MOCVD to growth Al-content gradually-changed AlGaN layers on Si substrate with Mg-dopant periodically enriching and gradually decreasing. By controlling the gradients of Al-content changing and the dopant-self-induced doping structure parameters, we will obtain high-efficient p-type AlGaN layer and we will apply the technique to Si-based AlGaN DUV-LED to improve the LED quantum efficiency. The project presented here provides a new approach to realize high-efficient p-AlGaN layer with high Al content, and will probably promote the performance of Si-based AlGaN DUV-LED devices.
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DOI:
10.3390/cryst12121812
发表时间:
2022-12
期刊:
Crystals
影响因子:
2.7
作者:
[Chunyue Zhang;Ke Jiang;Xiaojuan Sun;Dabing Li]
通讯作者:
Chunyue Zhang;Ke Jiang;Xiaojuan Sun;Dabing Li
DOI:
10.29026/oea.2023.230004
发表时间:
2023-01-01
期刊:
OPTO-ELECTRONIC ADVANCES
影响因子:
14.1
作者:
[Jiang, Ke, Liang, Simeng, Xu, Ke]
通讯作者:
Xu, Ke
Quantum engineering of non-equilibrium efficient p-doping in ultra-wide band-gap nitrides.
非平衡有效P掺杂的量子工程在超宽的氮化体中。
DOI:
10.1038/s41377-021-00503-y
发表时间:
2021-03-31
期刊:
Light, science & applications
影响因子:
--
作者:
[Jiang K, Sun X, Shi Z, Zang H, Ben J, Deng HX, Li D]
通讯作者:
Li D
DOI:
10.1039/d3na00780d
发表时间:
2024-01-16
期刊:
NANOSCALE ADVANCES
影响因子:
4.7
作者:
[Jiang, Ke, Ben, Jianwei, Sun, Xiaojuan, Shi, Zhiming, Wang, Xianjun, Fang, Tong, Zhang, Shanli, Lv, Shunpeng, Chen, Yang, Jia, Yuping, Zang, Hang, Liu, Mingrui, Li, Dabing]
通讯作者:
Li, Dabing
DOI:
10.1063/5.0064779
发表时间:
2021-10
期刊:
Applied Physics Letters
影响因子:
4
作者:
[Ke Jiang;Xiaojuan Sun;Yuxuan Chen;Shanli Zhang;Jianwei Ben;Yang Chen;Zi-hui Zhang;Yuping Jia;Z. Shi;Dabing Li]
通讯作者:
Ke Jiang;Xiaojuan Sun;Yuxuan Chen;Shanli Zhang;Jianwei Ben;Yang Chen;Zi-hui Zhang;Yuping Jia;Z. Shi;Dabing Li
共 10 条
AlGaN基紫外光电材料与器件
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批准号:62522413
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项目类别:青年科学基金项目(B类)
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资助金额:200.00万元
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批准年份:2025
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负责人:蒋科
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依托单位:
国内基金
海外基金