Low threshold voltage, highly stable electroforming-free threshold switching characteristics in VOx films-based device
Low threshold voltage, highly stable electroforming-free threshold switching characteristics in VOx films-based device
复制标题
VOx 薄膜器件中的低阈值电压、高度稳定的免电铸阈值开关特性
DOI:
10.1016/j.ceramint.2021.06.171
复制
发表时间:
2021-06
期刊:
影响因子:
--
通讯作者:
Hongyu Ma
中科院分区:
文献类型:
--
作者:
Guoqiang Li;Jianhong Wei;Hongjun Wang;Rui Xiong;Dengjing Wang;Yuanyuan Zhu;Yong Liu;Zhaorui Zou;Jing Xu;Hongyu Ma
Threshold switching (TS) devices have evolved as one of the most promising elements in memory circuit due to their important significance in suppressing crosstalk current in the crisscross array structure. However, the issue of high threshold voltage (Vth) and low stability still restricts their potential applications. Herein, the vanadium oxide (VOx) films deposited by the pulsed laser deposition (PLD) method are adopted as the switching layer to construct the TS devices. The TS devices with Pt/VOx/Pt/PI structure exhibit non-polar, electroforming-free, and volatile TS characteristics with an ultralow Vth(+0.48 V/−0.48 V). Besides that, the TS devices also demonstrates high stability, without obviously performance degradations after 350 cycles of endurance measurements. Additionally, the transition mechanism is mainly attributed to the synergistic effect of metal-insulator transition of VO2and oxygen vacancies. Furthermore, the nonvolatile bipolar resistance switching behaviors can be obtained by changing oxygen pressure during the deposition process for switching films. This work demonstrates that vanadium oxide film is a good candidate as switching layer for applications in the TS devices and opens an avenue for future electronics.
登录
查看更多内容
影响因子:
29.4
作者:
Liu, JF;Wang, X;Li, YD
通讯作者:
Li, YD
影响因子:
4.9
作者:
Jeonghwan Song;J. Woo;Seokjae Lim;Solomon Amsalu Chekol;H. Hwang
通讯作者:
Jeonghwan Song;J. Woo;Seokjae Lim;Solomon Amsalu Chekol;H. Hwang
影响因子:
4.9
作者:
R. Rosezin;E. Linn;L. Nielen;C. Kügeler;R. Bruchhaus;R. Waser
通讯作者:
R. Rosezin;E. Linn;L. Nielen;C. Kügeler;R. Bruchhaus;R. Waser
影响因子:
29.4
作者:
Lee, Myoung-Jae;Seo, Sunae;Park, Bae Ho
通讯作者:
Park, Bae Ho
影响因子:
8.4
作者:
C. Imawan;H. Steffes;F. Solzbacher;E. Obermeier
通讯作者:
C. Imawan;H. Steffes;F. Solzbacher;E. Obermeier