Electron heating in capacitively coupled RF plasmas: a unified scenario
Electron heating in capacitively coupled RF plasmas: a unified scenario
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电容耦合射频等离子体中的电子加热:统一场景
DOI:
10.1088/0963-0252/25/1/014001
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发表时间:
2015
影响因子:
3.8
通讯作者:
R.P. Brinkmann
中科院分区:
文献类型:
--
作者:
R.P. Brinkmann
[en] Electron heating in radio-frequency capacitively coupled plasmas (RF-CCP) is studied from first principles. The starting points are the electron equations of continuity and motion, with ionization neglected but electric and pressure forces and elastic collisions with the neutral background taken into account. Poisson’s equation self-consistently calculates the electric field; the ion density is assumed as a given. Postulating that the Debye length λ D is small compared to the sheath length scale l and the applied frequency ω RF is small compared to the electron plasma frequency ω pe, an asymptotic expansion in the smallness parameter ϵ= λ D/l∼ ω RF/ω pe is conducted. As has been demonstrated before (Brinkmann 2015 Plasma Sources Sci. Technol. 24 064002), this ansatz gives an expression—the smooth step model (SSM)—which yields (i) the space charge field in the unipolar region,(ii) the generalized Ohmic field in the ambipolar region, and (iii) a smooth interpolation for the rapid transition in between. Using the SSM and formulas for the electron density and the electron flux, expressions for the electric force and the electric power density are established which hold up to O (ϵ). Integrating over the sheath and taking the phase average, a representation for the total dissipated power is found as a sum of four physically distinct contributions. All terms correspond to electron heating mechanisms which are (explicitly or implicitly) already known but were so far discussed only within mutually incompatible frameworks.(paper)
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影响因子:
3.8
作者:
R.P. Brinkmann
通讯作者:
R.P. Brinkmann
DOI:
--
发表时间:
2014
期刊:
影响因子:
--
作者:
T. Lafleur;P. Chabert;M. Turner;J. Booth
通讯作者:
J. Booth
DOI:
--
发表时间:
1985
期刊:
影响因子:
--
作者:
O. Popov;V. Godyak
通讯作者:
V. Godyak
影响因子:
3.8
作者:
Lafleur, T.;Chabert, P.;Booth, J. P.
通讯作者:
Booth, J. P.
影响因子:
3.8
作者:
T. Lafleur;P. Chabert
通讯作者:
P. Chabert