Enhancement of Negative Differential Mobility Effect in Recessed Barrier Layer AlGaN/GaN HEMT for Terahertz Applications
Enhancement of Negative Differential Mobility Effect in Recessed Barrier Layer AlGaN/GaN HEMT for Terahertz Applications
复制标题
用于太赫兹应用的凹陷势垒层 AlGaN/GaN HEMT 中负微分迁移率效应的增强
DOI:
10.1109/ted.2019.2893640
复制
发表时间:
2019-02
影响因子:
3.1
通讯作者:
Yue Hao
中科院分区:
文献类型:
--
作者:
Hongliang Zhao;Lin-An Yang;Zou Hao;Xiao-Hua Ma;Yue Hao
A recessed barrier layer (RBL) structure is proposed in themicrometer-sized AlGaN/GaN high-electron mobility transistor (HEMT) for terahertz applications. It is found by using numerical simulation that the properly designed RBL structure can trigger the formation and propagation of electron domains in the 2-D electron gas (2-DEG) channel. As a result, the fundamental frequency can be extended even up to terahertz regime, and also it can be tuned in a certain range by the bias voltage of Schottky contact gate that acts as a hot-electron injector just like the notch-dopedGunn diode. Our simulations showthat the 0.3- $\mu \text{m}$ -gate HEMT with the RBL structure having the depth of 10–15 nm and the length of 200–400 nm can generate the stable and tunable oscillations in the range of around 0.8–1.6 THz under the normally gate bias of −0.2–0.4 V, as well as the ratio of RF-to-dc current component ranging from 3.04% to 7.2%. These available characteristics come from the redistribution of electric field in the 2-DEG channel. Compared with the ungated and the top-gated planar Gunn diodes ever reported, the proposed RBL structural AlGaN/GaN HEMT can be easily fabricated and operated under normal conditions, demonstrating a great potential application in terahertz radiation sources.
登录
查看更多内容
DOI:
10.1049/ip-cds:20040199
发表时间:
2004-04
期刊:
--
影响因子:
--
作者:
A. Matulionis;J. Liberis
通讯作者:
A. Matulionis;J. Liberis
影响因子:
4.3
作者:
M. Zybura;J. R. Jones;S. Jones;G. Tait
通讯作者:
M. Zybura;J. R. Jones;S. Jones;G. Tait
影响因子:
4.9
作者:
Khalid, A.;Pilgrim, N. J.;Cumming, D. R. S.
通讯作者:
Cumming, D. R. S.
影响因子:
3.2
作者:
Bhapkar, UV;Shur, MS
通讯作者:
Shur, MS
影响因子:
3.1
作者:
Shinohara, Keisuke;Regan, Dean C.;Micovic, Miroslav
通讯作者:
Micovic, Miroslav