Micro- and nano-surface structures based on vapor-deposited polymers.
Micro- and nano-surface structures based on vapor-deposited polymers.
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DOI：
10.3762/bjnano.8.138
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发表时间：
2017
影响因子：
3.1
通讯作者：
Chen HY
中科院分区：
文献类型：
--
作者：
Chen HY
气相沉积工艺和所得聚合物薄膜可提供一致的涂层，可解耦底层基材表面特性，并且无论基材材料和几何形状如何，均可应用于表面改性。这里，描述了构造这些气相沉积聚合物薄膜的各种方法。成熟且可用的光刻和软光刻技术被广泛用于在涂层基材上创建表面图案和微观结构。然而，由于应用光掩模或弹性体印模的要求，这些技术大多局限于平坦的基板。还尝试使用各种无掩模方法（例如光引导图案化和直写方法）在非平坦表面上产生图案化结构。在非平坦表面上进行图案化的限制是分辨率和成本。随着化学控制和/或与功能分子连接的精确可及性的要求，化学和形貌定义的界面最近引起了相当大的关注。还讨论了使用此类接口的多功能、梯度和/或协同活动。最后，展示了聚合物涂层选择性沉积的新兴发现以及使用选择性沉积技术的自下而上的图案化方法。
Vapor-deposition processes and the resulting thin polymer films provide consistent coatings that decouple the underlying substrate surface properties and can be applied for surface modification regardless of the substrate material and geometry. Here, various ways to structure these vapor-deposited polymer thin films are described. Well-established and available photolithography and soft lithography techniques are widely performed for the creation of surface patterns and microstructures on coated substrates. However, because of the requirements for applying a photomask or an elastomeric stamp, these techniques are mostly limited to flat substrates. Attempts are also conducted to produce patterned structures on non-flat surfaces with various maskless methods such as light-directed patterning and direct-writing approaches. The limitations for patterning on non-flat surfaces are resolution and cost. With the requirement of chemical control and/or precise accessibility to the linkage with functional molecules, chemically and topographically defined interfaces have recently attracted considerable attention. The multifunctional, gradient, and/or synergistic activities of using such interfaces are also discussed. Finally, an emerging discovery of selective deposition of polymer coatings and the bottom-up patterning approach by using the selective deposition technology is demonstrated.
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