Ultraviolet electroluminescence properties from devices based on n-ZnO/i-NiO/p-Si light-emitting diode

Ultraviolet electroluminescence properties from devices based on n-ZnO/i-NiO/p-Si light-emitting diode
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基于 n-ZnO/i-NiO/p-Si 发光二极管的器件的紫外电致发光特性

DOI:
10.1016/j.optcom.2016.01.071
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发表时间:
2017-07
影响因子:
2.4
通讯作者:
Du Guotong
Du Guotong
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Wang Hui;Zhao Yang;Wu Chao;Wu Guoguang;Ma Yan;Dong Xin;Zhang Baolin;Du Guotong

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We fabricated the Ultraviolet light-emitting diode (LED) based on n-ZnO/i-NiO/p-Si heterostructure by metal-organic chemical vapor deposition (MOCVD). The device exhibited diode-like rectifying characteristics with a turn-on voltage of 3.2 V. The NiO film with high resistance state and [200] preferred orientation acted as an electron blocking layer, which produced a larger ZnO/NiO conduction band offset of 2.93 eV than that of ZnO/Si (0.30 eV). Under forward bias, prominent ultraviolet emissions peaked around 375 nm accompanying with rather weak blue–white emissions peaked around 480 nm were observed at room temperature. Furthermore, the mechanism of the electroluminescence was tentatively discussed in terms of the band diagram of the diode.
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