Ultrathin conformal devices for precise and continuous thermal characterization of human skin.
Ultrathin conformal devices for precise and continuous thermal characterization of human skin.
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DOI:
10.1038/nmat3755
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发表时间:
2013-10
期刊:
影响因子:
41.2
通讯作者:
Rogers, John A.
中科院分区:
文献类型:
--
作者:
Webb, R. Chad;Bonifas, Andrew P.;Behnaz, Alex;Zhang, Yihui;Yu, Ki Jun;Cheng, Huanyu;Shi, Mingxing;Bian, Zuguang;Liu, Zhuangjian;Kim, Yun-Soung;Yeo, Woon-Hong;Park, Jae Suk;Song, Jizhou;Li, Yuhang;Huang, Yonggang;Gorbach, Alexander M.;Rogers, John A.
Precision thermometry of the skin can, together with other measurements, provide clinically relevant information about cardiovascular health, cognitive state, malignancy and many other important aspects of human physiology. Here, we introduce an ultrathin, compliant skin-like sensor/actuator technology that can pliably laminate onto the epidermis to provide continuous, accurate thermal characterizations that are unavailable with other methods. Examples include non-invasive spatial mapping of skin temperature with millikelvin precision, and simultaneous quantitative assessment of tissue thermal conductivity. Such devices can also be implemented in ways that reveal the time-dynamic influence of blood flow and perfusion on these properties. Experimental and theoretical studies establish the underlying principles of operation, and define engineering guidelines for device design. Evaluation of subtle variations in skin temperature associated with mental activity, physical stimulation and vasoconstriction/dilation along with accurate determination of skin hydration through measurements of thermal conductivity represent some important operational examples.
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影响因子:
3.1
作者:
Bernjak, A.;Clarkson, P. B. M.;McClintock, P. V. E.;Stefanovska, A.
通讯作者:
Stefanovska, A.
影响因子:
3.1
作者:
Gorbach, Alexander M.;Ackerman, Hans C.;Kato, Gregory J.
通讯作者:
Kato, Gregory J.
影响因子:
2.7
作者:
Jansky, L;Vávra, V;Slovácek, K
通讯作者:
Slovácek, K
影响因子:
3.1
作者:
Kvandal, Per;Landsverk, Svein Aslak;Kirkeboen, Knut Arvid
通讯作者:
Kirkeboen, Knut Arvid
影响因子:
56.9
作者:
Kim, Dae-Hyeong;Lu, Nanshu;Rogers, John A.
通讯作者:
Rogers, John A.