Fabrication of a 2 inch free standing porous GaN crystal film and application in the growth of relaxed crack-free thick GaN
Fabrication of a 2 inch free standing porous GaN crystal film and application in the growth of relaxed crack-free thick GaN
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2英寸自支撑多孔GaN晶体薄膜的制备及其在松弛无裂纹厚GaN生长中的应用
DOI:
10.1039/d1ce01032h
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发表时间:
2021
期刊:
影响因子:
3.1
通讯作者:
Xiangang Xu
中科院分区:
文献类型:
--
作者:
Lei Liu;Ruixian Yu;Guodong Wang;Mingsheng Xu;Shouzhi Wang;Hongdi Xiao;Xiaobo Hu;Lei Zhang;Xiangang Xu
This paper describes the fabrication of a 2 inch free standing porous GaN crystal film and the application in the growth of relaxed crack-free thick GaN.
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影响因子:
3.2
作者:
G. Olsen;M. Ettenberg
通讯作者:
G. Olsen;M. Ettenberg
影响因子:
1.8
作者:
Hidenao Tanaka;A. Nakadaira
通讯作者:
Hidenao Tanaka;A. Nakadaira
影响因子:
3.1
作者:
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通讯作者:
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影响因子:
4
作者:
Chao, C. L.;Chiu, C. H.;Cheng, S. J.
通讯作者:
Cheng, S. J.
影响因子:
4
作者:
G. Zhang;Y. Tong;Z. Yang;S. Jin;J. Li;Z. Gan
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