Automated Computer Vision-Enabled Manufacturing of Nanowire Devices.
Automated Computer Vision-Enabled Manufacturing of Nanowire Devices.
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DOI:
10.1021/acsnano.2c08187
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发表时间:
2022-11-22
期刊:
影响因子:
17.1
通讯作者:
Alexander-Webber, Jack A.
中科院分区:
文献类型:
--
作者:
Potocnik, Teja;Christopher, Peter J.;Mouthaan, Ralf;Albrow-Owen, Tom;Burton, Oliver J.;Jagadish, Chennupati;Tan, Hark Hoe;Wilkinson, Timothy D.;Hofmann, Stephan;Joyce, Hannah J.;Alexander-Webber, Jack A.
We present a high-throughput method for identifying and characterizing individual nanowires and for automatically designing electrode patterns with high alignment accuracy. Central to our method is an optimized machine-readable, lithographically processable, and multi-scale fiducial marker system—dubbed LithoTag—which provides nanostructure position determination at the nanometer scale. A grid of uniquely defined LithoTag markers patterned across a substrate enables image alignment and mapping in 100% of a set of >9000 scanning electron microscopy (SEM) images (>7 gigapixels). Combining this automated SEM imaging with a computer vision algorithm yields location and property data for individual nanowires. Starting with a random arrangement of individual InAs nanowires with diameters of 30 ± 5 nm on a single chip, we automatically design and fabricate >200 single-nanowire devices. For >75% of devices, the positioning accuracy of the fabricated electrodes is within 2 pixels of the original microscopy image resolution. The presented LithoTag method enables automation of nanodevice processing and is agnostic to microscopy modality and nanostructure type. Such high-throughput experimental methodology coupled with data-extensive science can help overcome the characterization bottleneck and improve the yield of nanodevice fabrication, driving the development and applications of nanostructured materials.
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影响因子:
29.4
作者:
Guo, Nan;Hu, Weida;Lu, Wei
通讯作者:
Lu, Wei
DOI:
10.1063/10.0003218
发表时间:
2021-03-01
期刊:
NANOTECHNOLOGY AND PRECISION ENGINEERING
影响因子:
--
作者:
Bai, Huitian;Wu, Sen
通讯作者:
Wu, Sen
DOI:
10.1116/1.568515
发表时间:
1975-01-01
期刊:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
影响因子:
--
作者:
CHANG, THP
通讯作者:
CHANG, THP
影响因子:
13.3
作者:
Dayeh, Shadi A.;Yu, Edward T.;Wang, Deli
通讯作者:
Wang, Deli
影响因子:
19.6
作者:
Frolov, S. M.;Manfra, M. J.;Sau, J. D.
通讯作者:
Sau, J. D.