Magnetic properties and characterization of CoCrM/TiCr/Si films produced by pulsed laser deposition
Magnetic properties and characterization of CoCrM/TiCr/Si films produced by pulsed laser deposition
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脉冲激光沉积 CoCrM/TiCr/Si 薄膜的磁性能和表征
DOI:
10.1016/j.jmmm.2007.11.020
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发表时间:
2008-04
影响因子:
2.7
通讯作者:
中科院分区:
文献类型:
--
作者:
A series of nanogranular CoCrM/TiCr thin films have been fabricated by pulsed-laser deposition on Si(111) substrates at 450–500°C. The crystal structure and magnetic properties of these films were investigated. The transmission electron microscope images with selected area diffraction and X-ray diffraction showed that the structure of as-prepared films is dependent on laser energy and deposition temperature. It was found that the microstructure of CoCrM/TiCr films consisted of fine dispersive crystal grains, while the preferential c-axis orientation of films deteriorated when the thickness of CoCr-alloy layer increased along with metal doping into the CoCr films. The magnetic properties of CoCrM/TiCr films formed on Si are strongly dependent on the thickness of magnetic layer, grain structure, and grain shape. Enhancement of coercivity and squareness of the laser-deposited film is probably due to the improvement in the magnetocrystalline anisotropy energy and the reduction in the thickness of magnetic layer.
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影响因子:
3.2
作者:
A. Ishikawa;K. Tanahashi;Y. Yahisa;Y. Hosoe;Y. Shiroishi
通讯作者:
A. Ishikawa;K. Tanahashi;Y. Yahisa;Y. Hosoe;Y. Shiroishi
影响因子:
3.2
作者:
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通讯作者:
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DOI:
10.1007/s00339-004-2839-z
发表时间:
2004-09
期刊:
Applied Physics A
影响因子:
--
作者:
S. Fähler;U. Hannemann;M. Weisheit;V. Neu;S. Melcher;S. Leinert;S. Wimbush;A. Singh;A. Kwon;B. Holzapfel;L. Schultz
通讯作者:
S. Fähler;U. Hannemann;M. Weisheit;V. Neu;S. Melcher;S. Leinert;S. Wimbush;A. Singh;A. Kwon;B. Holzapfel;L. Schultz
影响因子:
6
作者:
M. Futamoto;K. Terayama;Katsuaki Sato;Y. Hirayama
通讯作者:
M. Futamoto;K. Terayama;Katsuaki Sato;Y. Hirayama
DOI:
10.1109/20.908429
发表时间:
2000-09
期刊:
--
影响因子:
--
作者:
B. Lu;J. Zou;D. Lambeth;D. Laughlin
通讯作者:
B. Lu;J. Zou;D. Lambeth;D. Laughlin