Freestanding high-aspect-ratio gold masks for low-energy, phase-based x-ray microscopy.
Freestanding high-aspect-ratio gold masks for low-energy, phase-based x-ray microscopy.
复制标题
DOI：
10.1088/1361-6528/ac9b5f
复制
发表时间：
2022-11-07
期刊：
影响因子：
3.5
通讯作者：
中科院分区：
文献类型：
--
作者：
高分辨率X射线相衬显微术是一种基于窄缝高深宽比金光栅的关键技术，在生物医学成像和诊断领域具有广阔的应用前景。我们提出了一种新型低能X射线显微镜的独立式10 μ m厚的金膜掩模的开发，制造细节和实验测试，该掩模具有0.9-1.5 μm的空隙狭缝孔径阵列。整个掩模尺寸为4 mm × 4 mm，光栅间距为7.5 μm，6.0-6.6 μ m宽的金条由3 μ m宽的400 μm间隔的交联支撑。该制造工艺基于将金电镀到涂覆有各种薄膜的硅模具中以形成电压阻挡层、电镀基底和牺牲层，随后移除模具以获得具有空隙狭缝孔的独立金膜。我们讨论了材料和工艺的关键方面，包括金结构的均匀性，残余应力，并防止网格元件的崩溃。我们进一步证明了使用非相干旋转阳极X射线管获得生物样品的高分辨率，高对比度2D图像的可能性。
High-resolution, X-ray phase contrast microscopy, a key technique with promising potential in biomedical imaging and diagnostics, is based on narrow-slit high-aspect-ratio gold gratings. We present the development, fabrication details, and experimental testing of the freestanding 10-μm-thick gold membrane masks with an array of 0.9–1.5 μm void slit apertures for a novel low-energy X-ray microscope. The overall mask size is 4 mm × 4 mm, with a grating pitch of 7.5 μm, 6.0–6.6-μm-wide gold bars are supported by 3-μm-wide crosslinks at 400 μm intervals. The fabrication process is based on gold electroplating into a silicon mold coated with various thin films to form a voltage barrier, plating base, and sacrificial layer, followed by the mold removal to obtain the freestanding gold membrane with void slit apertures. We discuss key aspects for the materials and processes, including gold structures homogeneity, residual stresses, and prevention of collapsing of the grid elements. We further demonstrate the possibility to obtain high-resolution, high contrast 2D images of biological samples using an incoherent, rotating anode X-ray tube.
登录
查看更多内容
影响因子：
19.6
作者：
Pfeiffer, F;Weitkamp, T;David, C
通讯作者：
David, C
影响因子：
2.3
作者：
Kuwabara, Hiroaki;Yashiro, Wataru;Momose, Atsushi
通讯作者：
Momose, Atsushi
影响因子：
2.2
作者：
Green, Todd A.
通讯作者：
Green, Todd A.
影响因子：
10.8
作者：
Miao H;Gomella AA;Chedid N;Chen L;Wen H
通讯作者：
Wen H
通过在高纵横比硅模板中离心沉积双峰钨粒子，制造 X 射线吸收光栅。
影响因子：
4.6
作者：
Pinzek S;Gustschin A;Gustschin N;Viermetz M;Pfeiffer F
通讯作者：
Pfeiffer F