Concentration-Dependent Multi-Potentiality of L-Arginine: Antimicrobial Effect, Hydroxyapatite Stability, and MMPs Inhibition.
Concentration-Dependent Multi-Potentiality of L-Arginine: Antimicrobial Effect, Hydroxyapatite Stability, and MMPs Inhibition.
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L-精氨酸的浓度依赖性多电位:抗菌作用,羟基磷灰石稳定性和MMP抑制。
DOI:
10.3390/molecules26216605
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发表时间:
2021-10-31
期刊:
影响因子:
--
通讯作者:
Daood U
中科院分区:
文献类型:
--
作者:
Bijle MN;Pichika MR;Mak KK;Parolia A;Babar MG;Yiu C;Daood U
This study’s objective was to examine L-arginine (L-arg) supplementation’s effect on mono-species biofilm (Streptococcus mutans/Streptococcus sanguinis) growth and underlying enamel substrates. The experimental groups were 1%, 2%, and 4% arg, and 0.9% NaCl was used as the vehicle control. Sterilised enamel blocks were subjected to 7-day treatment with test solutions and S. mutans/S. sanguinis inoculum in BHI. Post-treatment, the treated biofilms stained for live/dead bacterial cells were analysed using confocal microscopy. The enamel specimens were analysed using X-ray diffraction crystallography (XRD), Raman spectroscopy (RS), and transmission electron microscopy (TEM). The molecular interactions between arg and MMP-2/MMP-9 were determined by computational molecular docking and MMP assays. With increasing arg concentrations, bacterial survival significantly decreased (p < 0.05). The XRD peak intensity with 1%/2% arg was significantly higher than with 4% arg and the control (p < 0.05). The bands associated with the mineral phase by RS were significantly accentuated in the 1%/2% arg specimens compared to in other groups (p < 0.05). The TEM analysis revealed that 4% arg exhibited an ill-defined shape of enamel crystals. Docking of arg molecules to MMPs appears feasible, with arg inhibiting MMP-2/MMP-9 (p < 0.05). L-arginine supplementation has an antimicrobial effect on mono-species biofilm. L-arginine treatment at lower (1%/2%) concentrations exhibits enamel hydroxyapatite stability, while the molecule has the potential to inhibit MMP-2/MMP-9.
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影响因子:
3.7
作者:
Nascimento MM;Browngardt C;Xiaohui X;Klepac-Ceraj V;Paster BJ;Burne RA
通讯作者:
Burne RA
影响因子:
7.6
作者:
Kato, M. T.;Bolanho, A.;Buzalaf, M. A. R.
通讯作者:
Buzalaf, M. A. R.
影响因子:
4.2
作者:
Ganss, C.;Lussi, A.;Schlueter, N.
通讯作者:
Schlueter, N.
影响因子:
4.4
作者:
Bijle, Mohammed Nadeem;Abdalla, Mohamed Mahmoud;Yiu, Cynthia Kar Yung
通讯作者:
Yiu, Cynthia Kar Yung
DOI:
10.1007/s10096-013-1993-7
发表时间:
2014-04
影响因子:
4.5
作者:
Krzysciak, W.;Jurczak, A.;Koscielniak, D.;Bystrowska, B.;Skalniak, A.
通讯作者:
Skalniak, A.