High-yield chemical vapor deposition growth of high-quality large-area AB-stacked bilayer graphene.
High-yield chemical vapor deposition growth of high-quality large-area AB-stacked bilayer graphene.
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DOI:
10.1021/nn302918x
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发表时间:
2012-09-25
期刊:
影响因子:
17.1
通讯作者:
Duan X
中科院分区:
文献类型:
--
作者:
Liu L;Zhou H;Cheng R;Yu WJ;Liu Y;Chen Y;Shaw J;Zhong X;Huang Y;Duan X
Bernal stacked (AB stacked) bilayer graphene is of significant interest for functional electronic and photonic devices due to the feasibility to continuously tune its band gap with a vertical electrical field. Mechanical exfoliation can be used to produce AB stacked bilayer graphene flakes but typically with the sizes limited to a few micrometers. Chemical vapor deposition (CVD) has been recently explored for the synthesis of bilayer graphene but usually with limited coverage and a mixture of AB and randomly stacked structures. Herein we report a rational approach to produce large-area high quality AB stacked bilayer graphene. We show that the self-limiting effect of graphene growth on Cu foil can be broken by using a high H2/CH4 ratio in a low pressure CVD process to enable the continued growth of bilayer graphene. A high temperature and low pressure nucleation step is found to be critical for the formation of bilayer graphene nuclei with high AB stacking ratio. A rational design of a two-step CVD process is developed for the growth of bilayer graphene with high AB stacking ratio (up to 90 %) and high coverage (up to 99 %). The electrical transport studies demonstrated that devices made of the as-grown bilayer graphene exhibit typical characteristics of AB stacked bilayer graphene with the highest carrier mobility exceeding 4,000 cm2/V·s at room temperature, comparable to that of the exfoliated bilayer graphene.
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