Investigation into polishing process of CVD diamond films
Investigation into polishing process of CVD diamond films
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CVD金刚石薄膜抛光工艺研究
DOI：
10.1081/amp-120002796
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发表时间：
2002-04
期刊：
影响因子：
--
通讯作者：
C.Y.Wang
中科院分区：
文献类型：
--
作者：
Z.N.Guo;C.Y.Wang
研究了一种用于化学气相沉积(CVD)金刚石膜抛光的新技术，该技术可以有效地实现CVD金刚石膜的粗抛光。在CVD金刚石膜上预先涂覆一层薄薄的导电材料，然后进行电火花加工。结果，金刚石膜表面的峰被迅速去除。在加工过程中，金刚石的石墨化使电火花加工过程得以继续。单脉冲放电实验表明，涂层材料对CVD金刚石膜的去除行为有明显的影响。与普通金属材料的加工相比，电火花化学气相沉积金刚石膜具有不同于普通金属材料的加工特点。讨论了CVD金刚石膜的去除机理。
A new technique used for polishing chemical vapor deposition (CVD) diamond films has been investigated, by which rough polishing of the CVD diamond films can be achieved efficiently. A CVD diamond film is coated with a thin layer of electrically conductive material in advance, and then electro-discharge machining (EDM) is used to machine the coated surface. As a result, peaks on the surface of the diamond film are removed rapidly. During machining, graphitization of diamond enables the EDM process to continue. The single pulse discharge shows that the material of the coated layer evidently affects removal behavior of the CVD diamond films. Compared with the machining of ordinary metal materials, the process of EDM CVD diamond films possesses a quite different characteristic. The removal mechanism of the CVD diamond films is discussed.
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影响因子：
5.4
作者：
M. Yoshikawa;F. Okuzumi
通讯作者：
M. Yoshikawa;F. Okuzumi
DOI：
10.1016/0168-583x(95)01007-6
发表时间：
1996-05
影响因子：
1.3
作者：
A. Yoshida;M. Deguchi;M. Kitabatake;T. Hirao;J. Matsuo;N. Toyoda;I. Yamada
通讯作者：
A. Yoshida;M. Deguchi;M. Kitabatake;T. Hirao;J. Matsuo;N. Toyoda;I. Yamada
影响因子：
1.9
作者：
B. Bovard;T. Zhao;H. Macleod
通讯作者：
B. Bovard;T. Zhao;H. Macleod
影响因子：
2.1
作者：
Si-Kyung Choi;D. Jung;S. Kweon;S. Jung
通讯作者：
Si-Kyung Choi;D. Jung;S. Kweon;S. Jung