Effect of laser repetition rate on the growth of Sc2O3 via pulsed laser deposition

Effect of laser repetition rate on the growth of Sc2O3 via pulsed laser deposition
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激光重复频率对脉冲激光沉积 Sc2O3 生长的影响

DOI:
10.1007/s00339-022-05698-4
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发表时间:
2022
期刊:
Applied Physics A
影响因子:
--
通讯作者:
Govindassamy G
Govindassamy G
中科院分区:
--
文献类型:
--
作者:
Govindassamy G

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本文研究了脉冲激光沉积(PLD)工艺中激光脉冲重复频率和基片温度对定向蓝宝石衬底上生长的Sc2 O3薄膜性能的影响<0001>。对于基板激光加热功率的范围内调查,最佳<111>的薄膜生长,获得在最高可用的重复频率为100 Hz。扫描电子显微镜和X-射线衍射测量表明,在重复率的下降有利于高度纹理/岛的增长。重复率也被证明会影响薄膜的晶格常数,在高重复率和低重复率下生长的薄膜之间的差异高达0.3%。总的趋势表明,当脉冲重复率增加时,膜的面外晶格常数向体值移动。然而,晶格常数也可以通过原位生长后退火来减小,这具有减小(222)摇摆曲线峰的宽度的额外益处。这项工作提供了进一步的证据,能量PLD动力学导致更高质量的PLD生长的晶体薄膜,并为这种材料破坏了旧的格言,较低的脉冲重复率导致更高质量的薄膜晶体生长。
This paper reports a study of the effect of laser pulse repetition rate and substrate temperature on the properties of crystalline Sc2O3films grown on <0001>-oriented sapphire via pulsed laser deposition (PLD). For the range of substrate laser-heating powers investigated, optimum <111>-film growth was obtained at the highest available repetition rate of 100 Hz. Scanning electron microscopy and X-ray diffraction measurements revealed that a decrease in the repetition rate favours highly textured/island growth. The repetition rate was also proven to affect the lattice constant of the films, with a difference up to 0.3% between the films grown at high and low repetition rates. The general trend indicates that the out-of-plane lattice constant of the film shifts closer to the bulk value when the pulse repetition rate is increased. However, the lattice constant could also be reduced through in-situ post-growth annealing, which had the additional benefit of reducing the width of the (222) rocking curve peak. This work provides further evidence that energetic-PLD dynamics leads to higher quality PLD-grown crystalline films and for this material undermines the old adage that lower pulse repetition rates lead to higher quality thin-film crystalline growth.
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