High Sensitivity SERS Substrate of a Few Nanometers Single-Layer Silver Thickness Fabricated by DC Magnetron Sputtering Technology.
High Sensitivity SERS Substrate of a Few Nanometers Single-Layer Silver Thickness Fabricated by DC Magnetron Sputtering Technology.
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DOI：
10.3390/nano12162742
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发表时间：
2022-08-10
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影响因子：
--
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中科院分区：
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表面增强拉曼光谱（Sers）通常用于通过纳米结构银层进行环境、食品质量、生物医学和材料科学中的超选择性分析。为了制备灵敏度高、操作方便的Sers器件，采用直流磁控溅射技术实现了高灵敏度、低成本、稳定的沉积速率和快速的批量生产。本研究借由场发射扫描电子显微镜、X射线绕射仪及X射线光电子能谱仪，探讨不同厚度之银膜在3.0至12.1奈米范围内的变化。在He-Ne激光束照射的罗丹明6 G（R6 G）检测中，分析增强因子（AEF）为9.35 × 108，检测限（LOD）为10−8 M，相对标准偏差为1.61%结果表明，6 nm厚的银层具有较好的Sers性能，最高的灵敏度、稳定性和使用寿命。对百草枯和乙酰胆碱分析物进行了进一步研究，也实现了高灵敏度。对提出的Sers样品进行了评估，并在低湿度环境中储存长达40周，没有检测到光谱衰减。很快，所提出的制造高灵敏度、可重复性和鲁棒性Sers基底的技术将成为多种应用中的优化工艺技术。
Surface-enhanced Raman spectroscopy (SERS) is commonly used for super-selective analysis through nanostructured silver layers in the environment, food quality, biomedicine, and materials science. To fabricate a high-sensitivity but a more accessible device of SERS, DC magnetron sputtering technology was used to realize high sensitivity, low cost, a stable deposition rate, and rapid mass production. This study investigated various thicknesses of a silver film ranging from 3.0 to 12.1 nm by field emission scanning electron microscope, X-ray diffraction, and X-ray photoelectron spectroscopy. In the rhodamine 6G (R6G) testing irradiated by a He-Ne laser beam, the analytical enhancement factor (AEF) of 9.35 × 108, the limit of detection (LOD) of 10−8 M, and the relative standard deviation (RSD) of 1.61% were better than the other SERS substrates fabricated by the same DC sputtering process because the results showed that the 6 nm thickness silver layer had the highest sensitivity, stability, and lifetime. The paraquat and acetylcholine analytes were further investigated and high sensitivity was also achievable. The proposed SERS samples were evaluated and stored in a low humidity environment for up to forty weeks, and no spectrum attenuation could be detected. Soon, the proposed technology to fabricate high sensitivity, repeatability, and robust SERS substrate will be an optimized process technology in multiple applications.
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影响因子：
1.9
作者：
Hsu, Jin-Cherng;Wang, Paul W.;Lee, Cheng-Chung
通讯作者：
Lee, Cheng-Chung
影响因子：
4.4
作者：
Hao, E;Schatz, GC
通讯作者：
Schatz, GC
影响因子：
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作者：
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通讯作者：
Wang YL
影响因子：
2.6
作者：
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通讯作者：
Haik, Yousef
影响因子：
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作者：
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通讯作者：
Limsuwan, P.