Light trapping properties of surface textured ZnO:Al films deposited at various working pressures

Light trapping properties of surface textured ZnO:Al films deposited at various working pressures
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不同工作压力下沉积的表面织构 ZnO:Al 薄膜的光捕获性能

DOI:
10.1016/j.ceramint.2015.04.140
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发表时间:
2015-09
影响因子:
5.2
通讯作者:
W.
W.
中科院分区:
材料科学1区
文献类型:
--
作者:
Y. Wang;W. Ding;W. Jiang;S. Peng;Y. Wang;W.

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采用直流脉冲磁控溅射技术在玻璃衬底上制备了具有良好光电性能和光俘获性能的表面织构的ZnO:Al(AZO)薄膜,并在室温下对其进行了湿法化学腐蚀。详细研究了工作压力对AZO薄膜的刻蚀速率、结构和光电性能、光捕获能力以及刻蚀行为的影响。随着工作压力的增加,观察到不同的表面特征。讨论了表面织构结构与工作压力的关系。在0.8℃气压下沉积的AZO薄膜具有均匀明显的凹坑状表面织构结构,是一种有效的捕光织构表面。与之相对应的是,在0.8℃的气压下沉积的AZO薄膜具有较高的可见光透过率、电导率和雾化值。
Surface textured ZnO:Al (AZO) films with good optoelectronic and light trapping properties were prepared on glass substrates by direct current pulse magnetron sputtering followed by a wet chemical etching process in NaOH solution (5 wt%) at room temperature. The influence of working pressure on different properties of AZO films including etching rate, structural and optoelectronic properties, light trapping ability as well as etching behavior was studied in detail. Different surface features were observed with the increasing of working pressure. The relationship between surface textured structure and working pressure was discussed. The etched AZO film deposited at 0.8 Pa exhibited uniformly and distinctly crater-like surface textured structure, which is an effective textured surface for light trapping. Correspondingly, for the etched AZO film deposited at 0.8 Pa, high visible optical transparence, electrical conductivity and haze value were also achieved.
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