A broadband, high isolation millimeter-wave CMOS power amplifier using a transformer and transmission line matching topology

A broadband, high isolation millimeter-wave CMOS power amplifier using a transformer and transmission line matching topology
复制标题

一种采用变压器和传输线匹配拓扑的宽带、高隔离度毫米波 CMOS 功率放大器

DOI:
10.1007/s10470-014-0412-z
复制
发表时间:
2014-11
影响因子:
1.4
通讯作者:
Gao Jianjun
Gao Jianjun
中科院分区:
工程技术4区
文献类型:
--
作者:
Chen Bo;Shen Li;Liu Supeng;Zheng Yuanjin;Gao Jianjun

文献摘要

参考文献

相似文献

本文介绍了一种宽带毫米波放大器的设计和特性,该放大器采用130 nm标准RF-CMOS工艺,采用8金属层,晶体管/ fmax17 /161 GHz。功率放大器采用变压器与传输线匹配的拓扑结构,实现了芯片面积小、带宽宽的特点。为了便于优化,提出了一种新的集总变压器模型。测量到的3db带宽为20 GHz(从47到67 GHz),测量到的最大增益约为8.6 dB,输出1db压缩功率为9.36 dBm,从1.2 V直流电源中消耗90 mA电流。包含GSG和DC焊片时,PA的芯片面积为0.318 mm2,不包含焊片时,PA的芯片面积为0.141 mm2。
This paper presents the design and characterization of a broadband millimeter-wave PA realized in a 130 nm standard RF-CMOS process with 8-metal-layer and transistorfT/fMAXof 117/161 GHz. The power amplifier adopts transformer and transmission line matching topology which achieves small area of die and wide bandwidth. A new lumped transformer model is proposed to facilitate the optimization. The measured 3 dB bandwidth is 20 GHz (from 47 to 67 GHz), the measured maximum gain is about 8.6 dB, output 1 dB compression power is 9.36 dBm and consumes 90 mA current from DC supply 1.2 V. Including GSG and DC pads, the PA occupies a compact chip area of 0.318 mm2, and without pads, the PA occupies 0.141 mm2.
DOI: 10.1109/tmtt.2011.2131676
发表时间: 2011-04
影响因子: 4.3
作者:
B. Ku;Sang-Hyun Baek;Songcheol Hong
通讯作者: B. Ku;Sang-Hyun Baek;Songcheol Hong
DOI: 10.1109/tmtt.2012.2223229
发表时间: 2012-12-01
影响因子: 4.3
作者:
Chen, Jing-Hwa;Helmi, Sultan R.;Mohammadi, Saeed
通讯作者: Mohammadi, Saeed
DOI: 10.1109/jssc.2013.2265500
发表时间: 2013-06
影响因子: 5.4
作者:
Gang Liu;H. Schumacher
通讯作者: Gang Liu;H. Schumacher
DOI: 10.1007/s10470-012-9863-2
发表时间: 2011-12
影响因子: 1.4
作者:
M. Sayginer;M. Yazgi;H. Kuntman;B. Virdee
通讯作者: M. Sayginer;M. Yazgi;H. Kuntman;B. Virdee
DOI: 10.1109/isscc.2009.4977468
发表时间: 2009-05
期刊: 2009 IEEE International Solid-State Circuits Conference - Digest of Technical Papers
影响因子: --
作者:
K. Raczkowski;S. Thijs;W. Raedt;B. Nauwelaers;P. Wambacq
通讯作者: K. Raczkowski;S. Thijs;W. Raedt;B. Nauwelaers;P. Wambacq