The effect of chemical polishing treatment on the microstructure, photoelectric properties of CdZnTe polycrystalline films
The effect of chemical polishing treatment on the microstructure, photoelectric properties of CdZnTe polycrystalline films
复制标题
化学抛光处理对CdZnTe多晶薄膜微观结构和光电性能的影响
DOI：
10.1016/j.mssp.2020.105608
复制
发表时间：
2021-03
影响因子：
4.1
通讯作者：
Tingting Tan
中科院分区：
文献类型：
--
作者：
Yiwei Li;Yawei Wang;Wenyu Zhang;Kun Cao;Yang Li;Gangqiang Zha;Tingting Tan
In this paper, CdZnTe polycrystalline film grown by the close-spaced sublimation (CSS) was chemically polished. Energy dispersive spectrum (EDS), atomic force microscope (AFM), Raman spectroscopy, current-voltage (I–V) characteristics and current-time (I-T) measurements were used to test the effect of the corrosion time of brominated methanol etching solution (with the ratio of CH3OH:Br2= 50:1.5) on the structure, surface morphology and photoelectric properties of CdZnTe polycrystalline films. The results indicate that appropriate chemical polishing time can reduce the surface roughness, surface defects and leakage current of CdZnTe film and improve the photoelectric properties of CdZnTe film.
登录
查看更多内容
影响因子：
6.7
作者：
K. Yasuda;M. Niraula;H. Kusama;Y. Yamamoto;M. Tominaga;K. Takagi;Y. Aagata
通讯作者：
K. Yasuda;M. Niraula;H. Kusama;Y. Yamamoto;M. Tominaga;K. Takagi;Y. Aagata
影响因子：
4
作者：
Y. Znamenshchykov;V. Kosyak;O. Kononov;I. Shpetnyi;V. Grebinaha;P. Fochuk;A. Opanasyuk
通讯作者：
Y. Znamenshchykov;V. Kosyak;O. Kononov;I. Shpetnyi;V. Grebinaha;P. Fochuk;A. Opanasyuk
表面处理对近空间升华制备CdZnTe薄膜性能的影响
影响因子：
5.4
作者：
Yang Fan;Huang Jian;Zou Tianyu;Tang Ke;Zhang Zilong;Ma Yuncheng;Gou Saifei;Shen Yue;Wang Linjun;Lu Yicheng
通讯作者：
Lu Yicheng
影响因子：
4.1
作者：
Chen Li;J. Poplawsky;Yanfa Yan;S. Pennycook
通讯作者：
Chen Li;J. Poplawsky;Yanfa Yan;S. Pennycook
DOI：
10.1016/j.nima.2006.01.110
发表时间：
2006-07
影响因子：
1.4
作者：
P. Sellin
通讯作者：
P. Sellin