Temperature stability of ultra-thin mixed BaSr-oxide layers and their transformation

Temperature stability of ultra-thin mixed BaSr-oxide layers and their transformation
复制标题

超薄混合BaSr氧化物层的温度稳定性及其转变

DOI:
10.1088/0957-4484/23/30/305202
复制
发表时间:
2012
期刊:
影响因子:
3.5
通讯作者:
K.R. Hofmann
K.R. Hofmann
中科院分区:
材料科学3区
文献类型:
--
作者:
D. Müller-Sajak;S. Islam;H. Pfnür;K.R. Hofmann

文献摘要

参考文献

被引文献

相似文献

在研究Si(100)衬底上超薄Sr0.3Ba0.7O外延层和单晶Sr0.3Ba0.7O的物理、化学和电学性质的同时,我们还用X射线光电子能谱(XPS)、电子能量损失谱(EELS)和低能电子衍射(LEED)研究了它们的热稳定性。在400 ℃以上的温度下,开始转变成硅酸盐层。完全转化后的化学计量被确定为接近(Ba 0.8 Sr 0.2)2 SiO4除了只有几个单层的层,其中硅酸盐不是化学计量。有强烈的迹象表明,这种硅酸盐是稳定的,直到它在750 ℃以上的温度下解吸。结晶度,如LEED所示,在这种转变过程中丢失。虽然转化成硅酸盐与金属解吸和层的致密化相结合,但它们似乎保持封闭。此外,层解吸后,在Si界面处检测到微量的Ba硅化物。这种硅化物不能热解吸。对于3ML厚度,硅酸盐层已经具有5.9± 0.2eV的带隙。在暴露于空气时,不可逆地形成含碳和氧的物质,但不形成氢氧化物。
In the context of investigations of physical, chemical and electrical properties of ultra-thin layers of epitaxial and monocrystalline Sr 0.3 Ba 0.7 O on Si (100), we also investigated their thermal stability with x-ray photoelectron spectroscopy (XPS), electron energy loss spectroscopy (EELS), and low energy electron diffraction (LEED). At temperatures above 400 C, transformation into silicate layers sets in. The stoichiometry after complete transformation was determined to be close to (Ba 0.8 Sr 0.2) 2 SiO 4 except for layers of only a few monolayers, where the silicate is not stoichiometric. There are strong indications that this silicate is stable until it desorbs at temperatures above 750 C. Crystallinity, as seen with LEED, is lost during this transformation. Although transformation into silicate is coupled with metal desorption and compactification of the layers, they seem to remain closed. In addition, traces of Ba silicide at the Si interface were detected after layer desorption. This silicide cannot be desorbed thermally. The silicate layer has a bandgap of 5.9±0.2 eV already for 3 ML thickness. Upon exposure to air, carbon and oxygen containing species, but no hydroxide, are formed irreversibly.
(001) Si 上的硅化锶端接和硅酸盐外延
DOI: 10.1116/1.1434968
发表时间: 2002
期刊: Journal of Vacuum Science and Technology
影响因子: --
作者:
D. Norton;C. Park;Y. Lee;J. Budai
通讯作者: J. Budai
DOI: 10.1002/pssc.200982477
发表时间: 2010
期刊: Physica Status Solidi (c)
影响因子: --
作者:
D. Müller;A. Cosceev;C. Brand;K. Hofmann;H. Pfnür
通讯作者: H. Pfnür
Ba/Si(100)-2 × 1 界面 I:硅化物形成的 XPS 和 XAES 研究。
DOI: 10.1016/0039-6028(92)90022-x
发表时间: 1992
期刊: Surface Science
影响因子: 1.9
作者:
P. Weijs;J. Fuggle;P. Heide
通讯作者: P. Heide
BaSi2,单相 mit isolierten Si4-Tetraedern
DOI: 10.1002/ange.19630751010
发表时间: 1963
期刊: Angewandte Chemie
影响因子: --
作者:
H. Schäfer;K. Janzon;A. Weiss
通讯作者: A. Weiss
等离子体增强原子层沉积合成Hf-硅酸盐薄膜的特性
DOI: 10.1116/1.2966430
发表时间: 2008
期刊: Journal of Vacuum Science and Technology
影响因子: --
作者:
J. Liu;R. M. Martin;Jane P. Chang
通讯作者: Jane P. Chang