Polarization Control by Deep Ultra Violet Wire Grid Polarizers
Polarization Control by Deep Ultra Violet Wire Grid Polarizers
复制标题
通过深紫外线栅偏振器进行偏振控制
DOI:
10.1007/978-3-319-75325-6_13
复制
发表时间:
2017
期刊:
影响因子:
--
通讯作者:
S. Kroker
中科院分区:
文献类型:
--
作者:
T. Siefke;S. Kroker
Polarization is an inherent property of transversal electromagnetic light waves. Hence, the control of the polarization state is a fundamental requirement in many optical applications. Nowadays, optical measurement and fabrication technology strive to shorter wavelengths in the ultra violet to benefit from larger resolution and material specific electronic transitions used for analysis. Thanks to the progress of nano-technology it has become feasible to manufacture subwavelength devices such as wire grid polarizers for this wavelength regime. These elements offer a very large acceptance angle, large areas and can be integrated with other optical elements such as photo masks or image sensors. However, not only geometrical properties must be met, but also specific materials properties must be provided. In this chapter the principle concepts of polarizers basing on birefringence, reflection and dichroism are very briefly explained and their limitations are discussed. An overview of commercially available elements is given to set wire grid polarizer in a bigger picture and the characterization of polarizing elements is described. Further the working principle, structural and material requirements for wire grid polarizer are discussed in detail. The fabrication and design is presented. The transmittance spectra of fabricated elements exhibit resonances in the near ultra violet spectral region. It is discussed how these can be utilized to reconstruct the geometry and deduce the performance of the polarizers at much shorter, less accessible, wavelengths in the far ultra violet. Finally, a comparison of different materials for wire grid polarizers in the ultra violet wavelength range is presented.
登录
查看更多内容
DOI:
--
发表时间:
2005
期刊:
SPIE/COS Photonics Asia
影响因子:
--
作者:
A. Zibold;W. Harnisch;T. Scheruebl;N. Rosenkranz;J. Greif
通讯作者:
J. Greif
DOI:
--
发表时间:
2015
期刊:
Advanced Lithography
影响因子:
--
作者:
Y. Bourgin;T. Siefke;T. Käsebier;E. Kley;U. Zeitner
通讯作者:
U. Zeitner
DOI:
10.1364/josaa.15.001843
发表时间:
1998-07-01
影响因子:
1.9
作者:
Lalanne, P;Hugonin, JP
通讯作者:
Hugonin, JP
影响因子:
3.8
作者:
Y. Bourgin;T. Siefke;T. Käsebier;P. Genevée;A. Szeghalmi;E. Kley;U. Zeitner
通讯作者:
U. Zeitner
影响因子:
1.7
作者:
D. Franta;I. Ohlídal;P. Klapetek;P. Pokorný
通讯作者:
P. Pokorný