Influence of Schottky metal-semiconductor contact on the responsivity of UV photodetectors with internal gain
Influence of Schottky metal-semiconductor contact on the responsivity of UV photodetectors with internal gain
复制标题
肖特基金属-半导体接触对内增益紫外光电探测器响应度的影响
DOI:
10.1140/epjd/e2020-100587-6
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发表时间:
2020-06
期刊:
影响因子:
--
通讯作者:
赵新景
中科院分区:
文献类型:
--
作者:
周璇;蒋大勇;赵曼;段雨晗;孙佳梅;单春才;李倩;李萌;费晓淼;赵新景
AbstractMetal-semiconductor-metal (MSM) ultraviolet photodetector is fabricated on ZnO films, prepared by radio frequency magnetron sputtering technique on quartz substrates. The ZnO photodetector shows low dark current and external quantum efficiency (EQE) due to the gain effect. The device also exhibits a near linear responsivity dependence on voltage, which gradually rise to the peak first, then fall sharply, and then slightly rise again. A physical mechanism primarily focused on the relationship between carrier (electron-hole pairs) transport and barrier height at Schottky metal-semiconductor contact is given to explain the above phenomena. It is demonstrated as a straightforward and convenient way to enhance the internal gain of the simple ZnO-based Schottky photodetectors for application in the future.Graphical abstract
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影响因子:
--
作者:
Bao J;Shalish I;Su Z;Gurwitz R;Capasso F;Wang X;Ren Z
通讯作者:
Ren Z
影响因子:
9.5
作者:
A. Adl;A. Ma;Manisha Gupta;M. Benlamri;Y. Tsui;D. Barlage;K. Shankar
通讯作者:
A. Adl;A. Ma;Manisha Gupta;M. Benlamri;Y. Tsui;D. Barlage;K. Shankar
影响因子:
0.7
作者:
L. Kosyachenko;G. Lashkarev;A. Ievtushenko;V. Lazorenko;V. Sklyarchuk;O. Sklyarchuk
通讯作者:
L. Kosyachenko;G. Lashkarev;A. Ievtushenko;V. Lazorenko;V. Sklyarchuk;O. Sklyarchuk
影响因子:
4
作者:
Hou, Y. N.;Mei, Z. X.;Du, X. L.
通讯作者:
Du, X. L.
影响因子:
3.4
作者:
Ali, Ghusoon M.;Chakrabarti, P.
通讯作者:
Chakrabarti, P.