Fabrication and modeling of recessed traces for silicon-based neural microelectrodes.
Fabrication and modeling of recessed traces for silicon-based neural microelectrodes.
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DOI：
10.1088/1741-2552/abb9bd
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发表时间：
2020-10-08
影响因子：
4
通讯作者：
Han M
中科院分区：
文献类型：
--
作者：
Nolta NF;Ghelich P;Ersöz A;Han M
长期植入的神经微电极是神经科学研究和新兴临床应用的有力工具，但它们的有用性受到体内数月后失效倾向的限制。一种失效模式是保护导电迹线免受盐水环境影响的绝缘材料的降解。研究表明，机械应力会加速材料降解，这些应力往往集中在凸起的形貌上，如导电迹线。因此，为了避免凸起的形貌，我们开发了一种制造技术，在干蚀刻的自对准沟槽中凹陷（掩埋）迹线。该制造技术产生了约15 nm内的平坦度。有限元建模表明，凹进的几何形状将有望减少绝缘层中的内应力集中。最后，体外电化学测试证实，凹陷迹线具有与已建立的非凹陷装置设计相当的稳健记录和刺激能力。我们的凹陷迹线制造技术不需要额外的掩模，易于与现有工艺集成，并且有可能提高植入式神经设备的长期性能。
Chronically-implanted neural microelectrodes are powerful tools for neuroscience research and emerging clinical applications, but their usefulness is limited by their tendency to fail after months in vivo. One failure mode is the degradation of insulation materials that protect the conductive traces from the saline environment. Studies have shown that material degradation is accelerated by mechanical stresses, which tend to concentrate on raised topographies such as conducting traces. Therefore, to avoid raised topographies, we developed a fabrication technique that recesses (buries) the traces in dry-etched, self-aligned trenches. The fabrication technique produced flatness within approximately 15 nm. Finite element modeling showed that the recessed geometry would be expected to reduce intrinsic stress concentrations in the insulation layers. Finally, in vitro electrochemical tests confirmed that recessed traces had robust recording and stimulation capabilities that were comparable to an established non-recessed device design. Our recessed trace fabrication technique requires no extra masks, is easy to integrate with existing processes, and is likely to improve the long-term performance of implantable neural devices.
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