Assessing the Nature of the Distribution of Localised States in Bulk GaAsBi.

Assessing the Nature of the Distribution of Localised States in Bulk GaAsBi.
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DOI:
10.1038/s41598-018-24696-2
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发表时间:
2018-04-24
期刊:
影响因子:
4.6
通讯作者:
Ekins-Daukes NJ
Ekins-Daukes NJ
中科院分区:
综合性期刊3区
文献类型:
--
作者:
Wilson T;Hylton NP;Harada Y;Pearce P;Alonso-Álvarez D;Mellor A;Richards RD;David JPR;Ekins-Daukes NJ

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使用功率和温度相关的光致发光光谱对块状 GaAsBi 中的子带隙能态分布的性质进行了全面评估。观察到峰值发光能量的特征红-蓝-红位移表明材料中存在短程合金无序。载流子局域化能量的降低表明局域态行为对激发功率的强烈依赖性,并且归因于距价带边缘最远的能态的填充。对低温下光致发光线形的分析为从价带边缘延伸的局域态的高斯分布提供了有力的证据。此外,采用速率模型来理解光致发光的非均匀热猝灭,并表明存在构成局域态密度的两个类高斯分布。这些成分归因于 Bi 含量的微观波动,这是由于 GaAsBi 层上的短程合金无序,以及低温生长导致的 Bi 相关点缺陷的形成。
A comprehensive assessment of the nature of the distribution of sub band-gap energy states in bulk GaAsBi is presented using power and temperature dependent photoluminescence spectroscopy. The observation of a characteristic red-blue-red shift in the peak luminescence energy indicates the presence of short-range alloy disorder in the material. A decrease in the carrier localisation energy demonstrates the strong excitation power dependence of localised state behaviour and is attributed to the filling of energy states furthest from the valence band edge. Analysis of the photoluminescence lineshape at low temperature presents strong evidence for a Gaussian distribution of localised states that extends from the valence band edge. Furthermore, a rate model is employed to understand the non-uniform thermal quenching of the photoluminescence and indicates the presence of two Gaussian-like distributions making up the density of localised states. These components are attributed to the presence of microscopic fluctuations in Bi content, due to short-range alloy disorder across the GaAsBi layer, and the formation of Bi related point defects, resulting from low temperature growth.
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