On the Luminescence Properties and Surface Passivation Mechanism of III- and N-Polar Nanopillar Ultraviolet Multiple-Quantum-Well Light Emitting Diodes
On the Luminescence Properties and Surface Passivation Mechanism of III- and N-Polar Nanopillar Ultraviolet Multiple-Quantum-Well Light Emitting Diodes
复制标题
III极和N极纳米柱紫外多量子阱发光二极管的发光性能和表面钝化机理研究
DOI:
10.3390/mi11060572
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发表时间:
2020-06
期刊:
影响因子:
3.4
通讯作者:
Ye Jichun
中科院分区:
文献类型:
--
作者:
Sheikhi Moheb;Dai Yijun;Cui Mei;Li Liang;Liu Jianzhe;Lan Wenan;Jiang Rongrong;Guo Wei;Chee Kuan W. A.;Ye Jichun
The non-centrosymmetricity of III-nitride wurtzite crystals enables metal or nitrogen polarity with dramatically different surface energies and optical properties. In this work, III-polar and N-polar nanostructured ultraviolet multiple quantum wells (UV-MQWs) were fabricated by nanosphere lithography and reactive ion etching. The influence of KOH etching and rapid thermal annealing treatments on the luminescence behaviors were carefully investigated, showing a maximum enhancement factor of 2.4 in emission intensity for III-polar nanopillars, but no significant improvement for N-polar nanopillars. The discrepancy in optical behaviors between III- and N-polar nanopillar MQWs stems from carrier localization in III-polar surface, as indium compositional inhomogeneity is discovered by cathodoluminescence mapping, and a defect-insensitive emission property is observed. Therefore, non-radiative recombination centers such as threading dislocations or point defects are unlikely to influence the optical property even after post-fabrication surface treatment. This work lays solid foundation for future study on the effects of surface treatment on III- and N-polar nanostructured light-emitting-diodes and provides a promising route for the design of nanostructure photonic devices.
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影响因子:
2.4
作者:
Sheikhi Moheb;Guo Wei;Dai Yijun;Cui Mei;Hoo Jason;Guo Shiping;Xu Liang;Liu Jianzhe;Ye Jichun
通讯作者:
Ye Jichun
影响因子:
--
作者:
Tan S;Zhang J;Egawa T;Chen G;Luo X;Sun L;Zhu Y
通讯作者:
Zhu Y
影响因子:
3.5
作者:
Chiu, C. H.;Lu, T. C.;Hsueh, T. H.
通讯作者:
Hsueh, T. H.
影响因子:
29.4
作者:
Le, Binh H.;Zhao, Songrui;Mi, Zetian
通讯作者:
Mi, Zetian
影响因子:
3.8
作者:
Li, Qiming;Westlake, Karl R.;Wang, George T.
通讯作者:
Wang, George T.