High-frequency magnetic characteristics of Fe-Co-based nanocrystalline alloy films
High-frequency magnetic characteristics of Fe-Co-based nanocrystalline alloy films
复制标题
Fe-Co基纳米晶合金薄膜的高频磁特性
DOI：
10.1007/s11431-010-3148-8
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发表时间：
2010-06
期刊：
影响因子：
--
通讯作者：
K. Sumiyama
中科院分区：
文献类型：
--
作者：
D.L. Peng;D.L. Peng;X. Wang;X. Wang;W. Wang;W. Wang;G.H. Yue;G.H. Yue;Y. Chen;Y. Chen;T. Hihara;T. Hihara;K. Sumiyama;K. Sumiyama
采用新型能量簇沉积技术和传统磁控溅射技术制备了磁性软铁钴基纳米合金薄膜。研究了它们的结构、静磁性能和高频磁性能。在高能团簇沉积方法中，通过在衬底上施加高偏置电压，团簇束中的正电荷团簇被电加速并与来自相同团簇源的中性团簇一起沉积到负偏置衬底上，形成具有良好高频磁特性的高密度铁钴合金团簇组装膜。在传统的磁控溅射方法中，只需要旋转衬底支架，不需要在衬底上施加静电感应磁场，就可以制备出具有显著的面内单轴磁各向异性和良好软磁性能的fe - co基纳米晶合金薄膜。得到的Fe-Co-O、Fe-Co-Ti-N和Fe-Co-Cr-N薄膜在1.2 GHz频率下均具有超过500的高实磁导率。这使得铁钴基纳米晶合金薄膜成为高频软磁薄膜材料的潜在候选材料。
Magnetically soft Fe-Co-based nanocrystalline alloy films were produced by two preparation methods: One using a new energetic cluster deposition technique and another using a conventional magnetron sputtering technique. Their structural, static magnetic properties and high-frequency magnetic characteristics were investigated. In the energetic cluster deposition method, by applying a high-bias voltage to a substrate, positively charged clusters in a cluster beam were accelerated electrically and deposited onto a negatively biased substrate together with neutral clusters from the same cluster source, to form a high-density Fe-Co alloy cluster-assembled film with good high-frequency magnetic characteristics. In the conventional magnetron sputtering method, only by rotating substrate holder and without applying a static inducing magnetic field on the substrates, we produced Fe-Co-based nanocrystalline alloy films with a remarkable in-plane uniaxial magnetic anisotropy and a good soft magnetic property. The obtained Fe-Co-O, Fe-Co-Ti-N, and Fe-Co-Cr-N films all revealed a high real permeability exceeding 500 at a frequency up to 1.2 GHz. This makes Fe-Co-based nanocrystalline alloy films potential candidates as soft magnetic thin film materials for the high-frequency applications.
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影响因子：
4
作者：
Y. Liu;C. Tan;Zhongwu Liu;C. Ong
通讯作者：
Y. Liu;C. Tan;Zhongwu Liu;C. Ong
影响因子：
4
作者：
Peng, DL;Yamada, H;Sumiyama, K
通讯作者：
Sumiyama, K
影响因子：
3.2
作者：
Y. Liu;Zhongwu Liu;C. Tan;C. Ong
通讯作者：
Y. Liu;Zhongwu Liu;C. Tan;C. Ong
影响因子：
2.1
作者：
S. Russek;P. Kabos;T. Silva;F. Mancoff;Dexin Wang;Z. Qian;J. Daughton
通讯作者：
S. Russek;P. Kabos;T. Silva;F. Mancoff;Dexin Wang;Z. Qian;J. Daughton
影响因子：
4
作者：
G. Beach;A. Berkowitz;F. Parker;David J. Smith
通讯作者：
G. Beach;A. Berkowitz;F. Parker;David J. Smith