Demonstration of near-ideal Schottky contacts to Si-doped AlN
Demonstration of near-ideal Schottky contacts to Si-doped AlN
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演示与硅掺杂 AlN 的近乎理想肖特基接触
DOI:
10.1063/5.0174524
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发表时间:
2023
影响因子:
4
通讯作者:
Kohn, E.
中科院分区:
文献类型:
--
作者:
Quiñones, C. E.;Khachariya, D.;Bagheri, P.;Reddy, P.;Mita, S.;Kirste, R.;Rathkanthiwar, S.;Tweedie, J.;Pavlidis, S.;Kohn, E.
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影响因子:
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作者:
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通讯作者:
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影响因子:
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作者:
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影响因子:
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影响因子:
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P. Reddy;I. Bryan;Z. Bryan;J. Tweedie;S. Washiyama;R. Kirste;S. Mita;R. Collazo;Z. Sitar