Estimation of hole injection barrier at the poly-3(hexylthiophene)/metal interface using accumulated charge measurement

Estimation of hole injection barrier at the poly-3(hexylthiophene)/metal interface using accumulated charge measurement
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使用累积电荷测量估计聚 3(己基噻吩)/金属界面处的空穴注入势垒

DOI:
10.1016/j.orgel.2017.09.008
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发表时间:
2017
期刊:
Org. Electron
影响因子:
--
通讯作者:
Yamada Jun-ichi
Yamada Jun-ichi
中科院分区:
--
文献类型:
--
作者:
Tajima Hiroyuki;Yasukawa Naoto;Nakatani Hisaki;Sato Seiichi;Kadoya Tomofumi;Yamada Jun-ichi

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利用累积电荷测量(ACM)研究了区域规则-聚-3(己基噻吩)(rp - p3ht)/金属(Cu或Ag)界面上的空穴注入势垒。r - p3ht在55℃下的热处理降低了注入势垒。在n2中热退火的r - p3ht与Ag形成欧姆接触,与Cu形成肖特基接触。所得的注入势垒值,ϕB可以很好地用Mott-Schottky规则表示,即:ϕB= IE -Wm ‘,其中IE为RR-P3HT的电离能,wm ’为金属电极在空气中的功函数。在超高真空下进行的UPS研究报告中,没有观察到大真空水平位移的影响。
Hole injection barriers at the regioregular-poly-3(hexylthiophene) (RR-P3HT)/metal (Cu or Ag) interface were investigated using the accumulated charge measurement (ACM). Thermal annealing of RR-P3HT at 55 °C decreased the injection barrier. RR-P3HT thermally annealed in N2forms an ohmic contact with Ag and a Schottky contact with Cu. The obtained values of the injection barriers,ϕBwere well expressed by the Mott-Schottky rule, i.e.,ϕB= IE -Wm′, where IE is the ionization energy of RR-P3HT andWm′ is the work function of the metal electrode in air. The effect of the large vacuum level shift, reported in UPS studies conducted under ultrahigh vacuum, was not observed.
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