Estimation of hole injection barrier at the poly-3(hexylthiophene)/metal interface using accumulated charge measurement
Estimation of hole injection barrier at the poly-3(hexylthiophene)/metal interface using accumulated charge measurement
复制标题
使用累积电荷测量估计聚 3(己基噻吩)/金属界面处的空穴注入势垒
DOI:
10.1016/j.orgel.2017.09.008
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发表时间:
2017
期刊:
影响因子:
--
通讯作者:
Yamada Jun-ichi
中科院分区:
文献类型:
--
作者:
Tajima Hiroyuki;Yasukawa Naoto;Nakatani Hisaki;Sato Seiichi;Kadoya Tomofumi;Yamada Jun-ichi
Hole injection barriers at the regioregular-poly-3(hexylthiophene) (RR-P3HT)/metal (Cu or Ag) interface were investigated using the accumulated charge measurement (ACM). Thermal annealing of RR-P3HT at 55 °C decreased the injection barrier. RR-P3HT thermally annealed in N2forms an ohmic contact with Ag and a Schottky contact with Cu. The obtained values of the injection barriers,ϕBwere well expressed by the Mott-Schottky rule, i.e.,ϕB= IE -Wm′, where IE is the ionization energy of RR-P3HT andWm′ is the work function of the metal electrode in air. The effect of the large vacuum level shift, reported in UPS studies conducted under ultrahigh vacuum, was not observed.
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影响因子:
4
作者:
J. E. Lyon;A. Cascio;M. Beerbom;R. Schlaf;Y. Zhu;S. Jenekhe
通讯作者:
S. Jenekhe
影响因子:
1.5
作者:
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Nobuhiro Azuma
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3.7
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通讯作者:
Yamada Jun-ichi
DOI:
10.1016/j.orgel.2016.04.029
发表时间:
2016
期刊:
Org. Electronics
影响因子:
--
作者:
H. Tajima;F. Miyao;M. Mizukoshi;S. Sato
通讯作者:
S. Sato
影响因子:
5.5
作者:
Tsoi, Wing C.;Spencer, Steve J.;Kim, Ji-Seon
通讯作者:
Kim, Ji-Seon