Vacuum tribological properties of a-C:H film in relation to internal stress and applied load
Vacuum tribological properties of a-C:H film in relation to internal stress and applied load
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a-C:H 薄膜的真空摩擦学特性与内应力和外加载荷的关系
DOI：
10.1016/j.triboint.2013.11.004
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发表时间：
2014-03
影响因子：
6.2
通讯作者：
Zhou, Huidi
中科院分区：
文献类型：
--
作者：
Ji, Li;Ye, Yinping;Chen, Jianmin;Zhou, Huidi
采用中频非平衡磁控溅射法，以Ar/CH 4为溅射气体，制备了非晶碳氢（a-C：H）薄膜。研究了薄膜的微观结构和真空摩擦学性能与内应力和外加载荷（1，2，4和5 N）的关系。结果表明，随着源气体中Ar比例的增加，薄膜中的键合氢减少，薄膜的石墨化程度增加。同时，所有的薄膜具有超低的摩擦系数（约0.005），但相对较短的真空滑动寿命（短于900 s）。此外，通过降低内应力（在200 °C下退火）或在小的施加载荷（1 N）下滑动，该膜可以保持长于3600 s的滑动寿命。结果表明，内应力的松弛是真空中滑动寿命短的主要原因，而在相同的试验条件下，在空气中不发生这种现象。
Amorphous hydrogenated carbon (a-C:H) films were deposited by medium frequency unbalanced magnetron sputtering with Ar/CH4gases. The microstructure and vacuum tribological properties of the films in relation to internal stress and applied load (1, 2, 4 and 5 N) were investigated. The results show that the bonded hydrogen in the film decreases and the graphitization of the film increases with increasing Ar ratio in the source gases. Meanwhile, all the films have ultra-low friction coefficients (about 0.005) but relatively short sliding lifetimes (shorter than 900 s) in vacuum. Furthermore, the film can maintain a sliding lifetime longer than 3600 s either by lower the internal stress (annealed at 200 °C) or sliding at a small applied load (1 N). It has been found that relaxation of the internal stress is the main case of the short sliding lifetime in vacuum, whereas it does not occur in air under the same tested conditions.
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影响因子：
4
作者：
K. Enke;H. Dimigen;H. Huebsch
通讯作者：
K. Enke;H. Dimigen;H. Huebsch
影响因子：
5.4
作者：
Yongxia Wang;Yinping Ye;Hongxuan Li;L. Ji;Yongjun Wang;Xiaohong Liu;Jianmin Chen;Hui-di Zhou
通讯作者：
Yongxia Wang;Yinping Ye;Hongxuan Li;L. Ji;Yongjun Wang;Xiaohong Liu;Jianmin Chen;Hui-di Zhou
影响因子：
3.2
作者：
C. Hopf;T. Schwarz-Selinger;W. Jacob;A. Keudell
通讯作者：
C. Hopf;T. Schwarz-Selinger;W. Jacob;A. Keudell
DOI：
10.1177/1350650112469897
发表时间：
2013-01
期刊：
Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology
影响因子：
--
作者：
Yanxia Wu;Hongxuan Li;L. Ji;Liu Liu-Liu;Yinping Ye;Jianmin Chen;Hui-di Zhou
通讯作者：
Yanxia Wu;Hongxuan Li;L. Ji;Liu Liu-Liu;Yinping Ye;Jianmin Chen;Hui-di Zhou
影响因子：
4
作者：
GRILL, A;PATEL, V
通讯作者：
PATEL, V