Characteristics of Sputtered Lead Zirconate Titanate Thin Films With Different Layer Configurations and Large Thickness

Characteristics of Sputtered Lead Zirconate Titanate Thin Films With Different Layer Configurations and Large Thickness
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不同层结构、大厚度溅射锆钛酸铅薄膜的特性

DOI:
10.1109/tuffc.2020.3039230
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发表时间:
2021
期刊:
IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
影响因子:
--
通讯作者:
Maenaka Kazusuke
Maenaka Kazusuke
中科院分区:
--
文献类型:
--
作者:
Kanda Kensuke;Koyama Tsukasa;Yoshimura Takeshi;Murakami Shinichi;Maenaka Kazusuke

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为了评估 Pb(Zr,Ti)O3(PZT) 薄膜(约 10 μm 厚)的特性,制备了三种不同溅射配置——单层 (SL) 沉积、带内部电极的多层 (ML) 沉积和多步 (MS) 沉积。 SL 薄膜的介电特性比 ML 和 MS 薄膜差。 MS薄膜的可靠性和压电特性特别高,e31、f常数为-9.5 C·m-2。为了研究薄膜的孔隙率,采用了重建 3-D SEM 技术。重建的 3-D SEM 图像显示 ML 和 MS 薄膜中的空隙密度降低,从而提高了它们的性能。 MS 配置提供了 PZT 薄膜的最佳介电和压电性能。
To evaluate the characteristics of Pb(Zr,Ti)O3(PZT) thin films (about 10 μm thick) with three different sputtering configurations-single-layer (SL) deposition, multilayer (ML) deposition with internal electrodes, and multistep (MS) deposition-were prepared. The SL films exhibited poorer dielectric characteristics than the ML and MS films. The reliability and piezoelectric characteristics were especially high in the MS film, with an e31, fconstant of -9.5 C · m-2. To investigate the porosity of the films, reconstructed 3-D SEM technique is employed. Reconstructed 3-D SEM images revealed decreased void densities in the ML and MS films, which improved their performance. The MS configuration provided the best dielectric and piezoelectric performance of PZT films.
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