Catalytic Etching of Metals

金属催化蚀刻

• 批准号: 8616502
• 负责人: Jonathan Phillips
• 金额: $ 16.3万
• 依托单位: Pennsylvania State Univ University Park
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1987
• 资助国家: 美国
• 起止时间: 1987-07-15 至 1990-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8616502&HistoricalAwards=false
• 关键词: Catalytic; Etching; Metals

This is a study of the effects of direct interactions between free radicals and metals. It is designed to test a hypothesis on the mechanism of etching of metal foils and thin films formulated to account for the results of previous work. Methylene radicals, produced by ultraviolet photodecomposition of diazomethane or ketene are studied first, followed by other radicals including methyl and oxygen atoms. The occurrence of etching in various oxidation systems, including those for ethylene, hydrogen, ammonia, and propane, is being investigated over a variety of metals including platinum, platinum alloys, palladium, and silver. The results of these studies will then be applied to catalyst redispersion and selective etching of thin films for integrated circuits.

这是一项研究自由基与金属之间直接相互作用的影响。它的设计是为了检验关于金属箔和薄膜蚀刻机制的假设，该假设是为了解释以前的工作结果而制定的。首先研究了重氮甲烷或烯酮在紫外光分解作用下产生的亚甲基自由基，其次是甲基和氧原子等自由基。在各种氧化体系中蚀刻的发生，包括乙烯、氢、氨和丙烷的氧化体系，正在研究各种金属，包括铂、铂合金、钯和银。这些研究结果将应用于催化剂再分散和集成电路薄膜的选择性蚀刻。