Establishment of an Electron Beam Lithography Facility

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Electron beam writing capabilities are becoming increasingly important for research in a wide variety of fields. Because such electron beams can be focussed to small dimensions, they are capable of drawing lines which have widths which are a fraction of the wavelength of light; that is less than .00001 centimeters. For engineering applications, such widths are important in optical device and holographic design and will become increasingly so as the field develops further. Such e-beam writing machines are also seeing increased use in electronic and microwave device and systems design. The present proposed effort is for the purchase of such a machine, to be used as a shared facility, for applications to engineering research in emerging technologies.