Engineering Research Equiment Grant: Sputter Deposition System for Optical Devices and Materials Studies

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The development of the field of lightwave technology depends crucially upon the growth, characterization, and development of appropriate types of films, multi-layered structures, and devices. Various types of equipment are available for use in this area, one of the most versatile and economical is the so-called sputter deposition system. In this an ion or electron beam strikes a target of the material to be deposited. The material is then driven by electric fields to the substrate on which the deposition is to occur. This basic principle can be modified in a variety of ways depending upon the particular need; for instance, deposition, cleaning or etching can be done. The system proposed for purchase here is intended for use in the area of optical signal processing research.