U.S.-U.K. Cooperative Research: Inorganic Resist Materials for All-Vacuum Lithography

美英合作研究：用于全真空光刻的无机光刻胶材料

• 批准号: 8722490
• 负责人: Michael Kozicki
• 金额: $ 1.34万
• 依托单位: Arizona State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1988
• 资助国家: 美国
• 起止时间: 1988-04-01 至 1990-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8722490&HistoricalAwards=false
• 关键词: U.S.; U.K.; Cooperative; Research; Inorganic

This award will support collaborative research between Dr. Michael N. Kozicki, Department of Electrical and Computer Engineering, Arizona State University and Professor Alan Owen, University of Edinburgh, Scotland. The goal of the research is to study inorganic resist materials for all-vacuum lithography. Integrated circuit fabrication is still widely carried out by transporting the substrates between individual pieces of equipment in a "cleanroom" environment. Since it is impossible to control fully the contaminant content of the air, there is ample opportunity for particulates or vapors to impinge on the materials being processed, thereby altering device characteristics and reducing product yield. A complete fabrication process carried out under vacuum compatible conditions would result in a significant reduction in substrate contamination. Many process steps may already be carried out under vacuum, but lithography, a process which uses organic materials with volatile components, is not compatible with this concept. This is currently a barrier to the realization of all-vacuum processing. The objective of this program is to investigate the As-S/Ag inorganic resist system with a view to applying it to all vacuum-processing. This will be done in conjunction with the University of Edinburgh, which has considerable experience with the As-S chalcogenides and is currently performing research on the optimization of the As-S/Ag system for applications in microlithography. The cooperative program will involve fundamental materials science and physical chemistry research being done at Edinburgh, with an investigation of all-vacuum applications and the development of a full lithographical process being carried out at Arizona State University. Results of this research may have a significant impact on the development of silicon and compound semiconductor device fabrication technology.

该奖项将支持亚利桑那州立大学电气与计算机工程系的 Michael N. Kozicki 博士和苏格兰爱丁堡大学的 Alan Owen 教授之间的合作研究。 该研究的目标是研究用于全真空光刻的无机光刻胶材料。 集成电路制造仍然广泛地通过在“洁净室”环境中的各个设备之间运输基板来进行。 由于不可能完全控制空气中的污染物含量，因此颗粒或蒸汽有足够的机会撞击正在加工的材料，从而改变设备特性并降低产品产量。 在真空兼容条件下进行的完整制造工艺将显着减少基板污染。 许多工艺步骤可能已经在真空下进行，但光刻这种使用具有挥发性成分的有机材料的工艺与这一概念不兼容。 这是目前实现全真空加工的一个障碍。 该计划的目的是研究 As-S/Ag 无机光刻胶系统，以期将其应用于所有真空处理。 这项工作将与爱丁堡大学合作完成，爱丁堡大学在 As-S 硫属化物方面拥有丰富的经验，目前正在研究优化 As-S/Ag 系统在微光刻中的应用。 该合作计划将涉及在爱丁堡进行的基础材料科学和物理化学研究，以及在亚利桑那州立大学进行的全真空应用调查和全光刻工艺的开发。 这项研究的结果可能对硅和化合物半导体器件制造技术的发展产生重大影响。