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Fort Monmouth Interaction: Picosecond Photoconductors on MBE Grown Materials for High Speed Microelectronics

Fort Monmouth Interaction: Picosecond Photoconductors on MBE Grown Materials for High Speed Microelectronics
Fort Monmouth Interaction:用于高速微电子学的 MBE 生长材料上的皮秒光电导体
批准号:
8800548
负责人:
Chi Lee
金额:
$3.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-05-15 至 1990-04-30

项目摘要

项目成果

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中文摘要
翻译
PI将把皮秒光导体直接集成到由半导体量子阱和超晶格制成的微电子器件上。该项目与陆军电子技术与设备实验室(ETDL)合作,在MBE材料上开发高效皮秒光导体,并为高速电子设备设计片上皮秒测量技术。这是对最初由“新颖研究加速奖励”计划授予的拨款的续期支持请求。
英文摘要
The PI will integrate the picosecond photoconductors directly onto the microelectronic devices made from semiconductor quantum wells and superlattices. This is a collaboration with the Army Electronics Technology and Device Laboratory (ETDL) to develop efficient picosecond photoconductors on MBE materials and to devise on-chip picosecond measurement techniques for high speed electronic devices. This is a request for renewal support of a grant originally awarded by the "expedited awards for novel research" program.
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会议论文
Development of a Versatile, Multi-use Laser System for Research in Atomic, Molecular and Optical Science and Engineering
NSF Fort Monmouth Cooperative Program: Picosecond Photo- conductors on MBE Grown Materials for High Speed/High Fre- quency Microelectronics.
Expedited Award for Novel Research: Piosecond Photoconduc- tors on MBE Grown Materials for High Speed Microelectronics
The Study of Laser Induced Solid State Plasma for Millimeter-Wave Device Applications
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