Surface Mechanisms in the Chemical Vapor Deposition of Diamond

金刚石化学气相沉积的表面机制

• 批准号: 8807546
• 负责人: Mark D'Evelyn
• 金额: $ 40.93万
• 依托单位: William Marsh Rice University
• 依托单位国家: 美国
• 项目类别: Continuing grant
• 财政年份: 1988
• 资助国家: 美国
• 起止时间: 1988-08-01 至 1992-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8807546&HistoricalAwards=false
• 关键词: Surface; Mechanisms; Chemical; Vapor; Deposition

This grant, funded jointly by the Office of Special Projects in Chemistry and the Division of Materials Research provides support for the collaborative research of Drs. D'Evelyn and Hauge in Chemistry and Dr. Margrave in Materials Research at Rice University. The objective of the research is the elucidation of the surface mechanisms in diamond growth prepared by chemical vapor deposition (CVD) under well-defined conditions. Synthetic processes for the production of diamond films is an area of high technological interest. The work will employ chemically activated precursors, and will combine surface science studies of chemisorption and reaction with studies of the growth of macroscopic diamond films by low pressure CVD. This work will explore the structure and reactivity of adsorbed hydrogen and CH species, the relationship between the reaction conditions and the growth rate and quality of diamond films, the importance of nonthermal reactions in the growth process, and reactions of dopant precursors. Clean and adsorbate-covered single-crystal diamond surfaces will be characterized by low energy electron diffraction, Auger spectroscopy, electron energy loss spectroscopy and other advanced surface analytical techniques. Rate constants for elementary surface reactions will be determined. Diamond films grown by CVD using C-13 labeled precursors on diamond substrates will be characterized by Raman spectroscopy, reflection electron diffraction, electron microscopy and infrared attenuated total reflectance. The utility of laser-desorption mass spectrometry and laser ellipsometry as in situ probes of CVD growth will also be explored.

这笔赠款由化学特别项目办公室和材料研究部联合资助，为莱斯大学D‘Evelyn和Hauge博士和MarGrave博士在材料研究方面的合作研究提供支持。本研究的目的是阐明在特定条件下用化学气相沉积(CVD)方法生长金刚石的表面机理。生产金刚石薄膜的合成工艺是一个具有很高技术价值的领域。这项工作将使用化学激活的前体，并将结合表面科学对化学吸附和反应的研究，以及对低压CVD生长宏观金刚石薄膜的研究。这项工作将探索吸附的氢和CH物种的结构和反应性，反应条件与金刚石薄膜生长速度和质量的关系，非热反应在生长过程中的重要性，以及掺杂前体的反应。清洁和吸附的单晶金刚石表面将用低能电子衍射、俄歇能谱、电子能量损失谱和其他先进的表面分析技术进行表征。将确定基本表面反应的速率常数。用C-13标记前驱体在金刚石衬底上CVD生长的金刚石薄膜，用拉曼光谱、反射电子衍射、电子显微镜和红外衰减全反射光谱进行了表征。此外，还将探讨激光解吸质谱仪和激光椭偏技术作为CVD生长的原位探针的应用。